Creation of carbon semiconductor thin films containing silicon nanoparticles and their applications

2011 Fiscal Year Final Research Report

• Project/Area Number: 21760523
• Research Category: Grant-in-Aid for Young Scientists (B)
• Allocation Type: Single-year Grants
• Research Field: Inorganic materials/Physical properties
• Research Institution: Hirosaki University
• Principal Investigator: NAKAZAWA Hideki 弘前大学, 大学院・理工学研究科, 准教授 (90344613)
• Project Period (FY): 2009 – 2011
• Keywords: 電子・電気材料 / ナノ材料 / 半導体物性 / 光物性

Research Abstract

We have deposited carbon thin films containing spherical particles by radio-frequency plasma-enhanced chemical vapor deposition using methane and organosilicon compounds such as monomethylsilane and dimethylsilane as the silicon sources. Chemical composition analyses revealed that particles from monomethylsilane were composed mainly of silicon. Pulsed substrate bias or intermittent supply of monomethylsilane was used to control the generation and growth of particles. In addition, the size and density of particles changed with dilution gases, deposition pressure, and substrate bias.

Research Products

• [Journal Article] Characteristics of Silicon/ Nitrogen-Coincorporated Diamond-Like Carbon films Prepared by Plasma-Enhanced Chemical Vapor Deposition (2012)
  • Author(s): H. Nakazawa, S. Miura, R. Kamata, S. Okuno, Y. Enta, M. Suemitsu, T. Abe
  • Journal Title: Japanese Journal of Applied Physics Volume: Vol.51 Pages: 015603-1-015603-7
  • Peer Reviewed
• [Journal Article] Effects of Hydrogen on the Properties of Si-Incorporated Diamond-Like Carbon Films Prepared by Pulsed Laser Deposition (2011)
  • Author(s): H. Nakazawa, R. Osozawa, T. Okuzaki, N. Sato, M. Suemitsu, T. Abe
  • Journal Title: Diamond and Related Materials Volume: Vol.20 Pages: 485-491
  • Peer Reviewed
• [Journal Article] Effects of Silicon Source Gas and Substrate Bias on the Film Properties of Si-Incorporated Diamond-Like Carbon by Radio-Frequency Plasma-Enhanced Chemical Vapor Deposition (2009)
  • Author(s): H. Nakazawa, T. Kinoshita, Y. Kaimori, Y. Asai, M. Suemitsu, T. Abe, K. Yasui, T. Endoh, T. Itoh, Y. Narita, Y. Enta, M. Mashita
  • Journal Title: Japanese Journal of Applied Physics Volume: Vol.48 Pages: 116002-1-116002-8
  • Peer Reviewed
• [Journal Article] Hydrogen Effects on the Properties of Silicon/Nitrogen-Coincorporated
  • Author(s): H. Nakazawa, S. Okuno, S. Miura, R. Kamata
  • Journal Title: Diamond-Like Carbon Films Prepared by Plasma-Enhanced Chemical Vapor Deposition
  • Peer Reviewed
• [Presentation] Hydrogen Effects of the Properties of Silicon, Nitrogen-Coincorporated Diamond-Like Carbon Films Prepared by Plasma-Enhanced Chemical Vapor Deposition (2011)
  • Author(s): H. Nakazawa, S. Miura, S. Okuno, R. Kamata
  • Organizer: 22th European Conference on Diamond, Diamond-Like Materials, Carbon Nanotubes, and Nitrides
  • Place of Presentation: Garmisch-Partenkirchen, Germany
  • Year and Date: 20110000
• [Presentation] Diamond-Like Materials, Carbon Nanotubes, and Nitrides (2010)
  • Author(s): H. Nakazawa, R. Osozawa, T. Okuzaki, N. Sato, M. Suemitsu, T. Abe
  • Organizer: 21th European Conference on Diamond
  • Place of Presentation: Budapest, Hungary
  • Year and Date: 20100000
• [Presentation] パルスバイアスを用いたプラズマCVD法によるSi添加DLC膜特性のパルスパラメータ依存性 (2010)
  • Author(s): 鎌田亮輔、中澤日出樹、三浦創史、阿部俊三、末光眞希
  • Organizer: 第71回応用物理学学術講演会
  • Place of Presentation: 長崎大学
  • Year and Date: 20100000