2010 Fiscal Year Final Research Report
Development of Reactive Plasma Spray Process for Fabrication of High Quality Aluminum Nitride Coating
| Project/Area Number |
21760583
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| Research Category |
Grant-in-Aid for Young Scientists (B)
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| Allocation Type | Single-year Grants |
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| Research Field |
Material processing/treatments
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| Research Institution | Toyohashi University of Technology |
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Principal Investigator |
YAMADA Motohiro Toyohashi University of Technology, 大学院・工学研究科, 助教 (00432295)
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| Project Period (FY) |
2009 – 2010
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| Keywords | プラズマ溶射 / 窒化アルミニウム / 窒化反応 / コーティング |
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| Research Abstract |
Aluminum nitride (AlN) possesses high thermal conductivity with dielectric property. AlN is very useful in several applications though it hasn't been developed a thick coating process. In this research, AlN coating was successfully fabricated by reactive plasma spray using nitrogen/hydrogen plasma for the reaction of feedstock aluminum or alumina powders. The crystal of the AlN coating was cubic structure which is similar to aluminum oxynitride. It became clear that the nitrding process of feedstock powder is through oxynitride phase during flight in the plasma.
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