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2022 Fiscal Year Annual Research Report

Innovation in atomically controlled engineering of plasma etching technology with builiding a collaborative environment for theory, computation, and measurement

Research Project

Project/Area Number 21H01073
Research InstitutionNagoya University

Principal Investigator

関根 誠  名古屋大学, 低温プラズマ科学研究センター, 特任教授 (80437087)

Co-Investigator(Kenkyū-buntansha) 堤 隆嘉  名古屋大学, 低温プラズマ科学研究センター, 助教 (50756137)
石川 健治  名古屋大学, 低温プラズマ科学研究センター, 教授 (60417384)
Project Period (FY) 2021-04-01 – 2024-03-31
Keywordsプラズマ / エッチング
Outline of Annual Research Achievements

人類及び地球の繁栄のための持続的な開発を推進する上で,電子情報ナノシステムの発展は欠かせない.システムを構成する集積回路・センサ・アクチュエータなどの素子の作製は,微細加工・プラズマエッチングが基盤技術となり,現在1原子1分子レベルの反応プロセス制御『アトミックスケールエンジニアリング』が要求されるにもかかわらず,プラズマエッチング技術の開発には,試行錯誤が繰り返され,理論に基づく予測や原理に則した革新的な技術が創出されているとは言い難い.このような背景から,エッチング反応の原理的な解明が必要である.本研究では,この解明を達成する為,反応過程をⅠ)気相中反応,Ⅱ)活性種輸送,Ⅲ)表面反応の3段階に階層化し,階層的に解析スキームを構築することを目指す.それぞれ,原理的な理論構築から計算科学を活用したシミュレーション予測,反応を素過程に細分化した実証・検証実験,さらに大量生産に対応できるエッチング装置での実験,プラズマと表面の相互作用の進展を動力学解析等で実施する.すなわち,理論-計算-実験を統合した研究基盤を構築するアプローチを探索しながら,プラズマと表面の相互作用の『アトミックスケールエンジニアリング』を学問体系化し,次代イノベーション電子情報デバイスの創出に貢献する基盤技術を開拓する.今年度は,バーチャル実験環境の構築に,高アスペクト比構造の高材料選択比プラズマエッチング加工を取り上げた.そこで,過去においてもエッチング使用の経験のないハイドロフルオロカーボンのガスに着目し,数々の分子について量子化学計算を進め,電子衝突が及ぼす励起解離の予測に取り組んだ.

Current Status of Research Progress
Current Status of Research Progress

2: Research has progressed on the whole more than it was originally planned.

Reason

気相の解離反応の検証,装置を構築し実験系の準備し,偏光解析法による表面反応の動力学解析とシンクロトロン光による光電子・光イオンの同時(コインシデンス)測定に取り組んだ.反応性プラズマビーム装置を用いて,分子動力学計算予測の精度についても,検証準備を進め,階層的,統合的に解析を進めた結果に基づき,プラズマ加工のアトミックスケールエンジニアリングの学問を体系化しつつある.

Strategy for Future Research Activity

活性種輸送と表面反応との関連する実験データ取得し,並行して進める計算科学アプローチ結果を検証する.シンクロトロン光(1.2~25eV,分子研UVSOR・BL7U/BL7G)の光電子・光イオンの同時(コインシデンス)測定を実施しており,分子動力学計算予測の精度についても検証を本格的に実施を進める.量産対応可能なプラズマチャンバー(TEL・Tactras)を利用したプラズマチャンバー内のイオンの質量分析,負イオン量のレーザー刺激脱離測定,ラジカル種のレーザー誘起蛍光法(購入予定設備を含む)の分析と,反応表面の赤外分光分析と偏光解析法による表面反応の動力学解析,エッチング後のX線光電子分光解析と走査電子顕微鏡観察を行う.

  • Research Products

    (47 results)

All 2023 2022 Other

All Journal Article (8 results) (of which Int'l Joint Research: 1 results,  Peer Reviewed: 8 results,  Open Access: 2 results) Presentation (37 results) (of which Int'l Joint Research: 37 results,  Invited: 7 results) Remarks (2 results)

  • [Journal Article] GaN damage-free cyclic etching by sequential exposure to Cl2 plasma and Ar plasma with low Ar+ ion energy at substrate temperature of 400°C2023

    • Author(s)
      Nakamura Shohei、Tanide Atsushi、Kimura Takahiro、Nadahara Soichi、Ishikawa Kenji、Oda Osamu、Hori Masaru
    • Journal Title

      Journal of Applied Physics

      Volume: 133 Pages: 043302~043302

    • DOI

      10.1063/5.0131685

    • Peer Reviewed
  • [Journal Article] Science-based, data-driven developments in plasma processing for material synthesis and device-integration technologies2022

    • Author(s)
      Kambara Makoto、Kawaguchi Satoru、Lee Hae June、Ikuse Kazumasa、Hamaguchi Satoshi、Ohmori Takeshi、Ishikawa Kenji
    • Journal Title

      Japanese Journal of Applied Physics

      Volume: 62 Pages: SA0803~SA0803

    • DOI

      10.35848/1347-4065/ac9189

    • Peer Reviewed / Open Access
  • [Journal Article] Dry etching of ternary metal carbide TiAlC via surface modification using floating wire-assisted vapor plasma2022

    • Author(s)
      Nguyen Thi-Thuy-Nga、Shinoda Kazunori、Hamamura Hirotaka、Maeda Kenji、Yokogawa Kenetsu、Izawa Masaru、Ishikawa Kenji、Hori Masaru
    • Journal Title

      Scientific Reports

      Volume: 12 Pages: 20394

    • DOI

      10.1038/s41598-022-24949-1

    • Peer Reviewed / Open Access
  • [Journal Article] Dissociation channels of c-C4F8 to C2F4 in reactive plasma2022

    • Author(s)
      Hayashi Toshio、Ishikawa Kenji、Iwayama Hiroshi、Sekine Makoto、Hori Masaru
    • Journal Title

      Japanese Journal of Applied Physics

      Volume: 61 Pages: 106006~106006

    • DOI

      10.35848/1347-4065/ac895e

    • Peer Reviewed
  • [Journal Article] Wide range applications of process plasma diagnostics using vacuum ultraviolet absorption spectroscopy2022

    • Author(s)
      Takeda Keigo、Ishikawa Kenji、Hori Masaru
    • Journal Title

      Reviews of Modern Plasma Physics

      Volume: 6 Pages: 13

    • DOI

      10.1007/s41614-022-00075-3

    • Peer Reviewed
  • [Journal Article] Effects of deposition precursors of hydrogenated amorphous carbon films on the plasma etching resistance based on mass spectrometer measurements and machine learning analysis2022

    • Author(s)
      Kurokawa Jumpei、Kondo Hiroki、Tsutsumi Takayoshi、Ishikawa Kenji、Sekine Makoto、Hori Masaru
    • Journal Title

      Vacuum

      Volume: 205 Pages: 111351~111351

    • DOI

      10.1016/j.vacuum.2022.111351

    • Peer Reviewed
  • [Journal Article] Study of optical emission spectroscopy using modified Boltzmann plot in dual-frequency synchronized pulsed capacitively coupled discharges with DC bias at low-pressure in Ar/O2/C4F8 plasma etching process2022

    • Author(s)
      Sahu Bibhuti Bhusan、Nakane Kazuya、Ishikawa Kenji、Sekine Makoto、Tsutsumi Takayoshi、Gohira Taku、Ohya Yoshinobu、Ohno Noriyasu、Hori Masaru
    • Journal Title

      Physical Chemistry Chemical Physics

      Volume: 24 Pages: 13883~13896

    • DOI

      10.1039/D2CP00289B

    • Peer Reviewed / Int'l Joint Research
  • [Journal Article] Low‐temperature reduction of SnO 2 by floating wire‐assisted medium‐pressure H2/Ar plasma2022

    • Author(s)
      Nguyen Thi‐Thuy‐Nga、Sasaki Minoru、Hsiao Shih‐Nan、Tsutsumi Takayoshi、Ishikawa Kenji、Hori Masaru
    • Journal Title

      Plasma Processes and Polymers

      Volume: 19 Pages: 2100209~2100209

    • DOI

      10.1002/ppap.202100209

    • Peer Reviewed
  • [Presentation] Plasma-driven science for emerging plasma-processing technologies2023

    • Author(s)
      Kenji Ishikawa, Hiromasa Tanaka, Hirokazu Hara, Shin-ichi Kondo, Masafumi Ito, Kazunori Koga, Masaharu Shiratani, and Masaru Hori
    • Organizer
      ISPlasma2023 / IC-PLANTS2023
    • Int'l Joint Research / Invited
  • [Presentation] Non-halogen plasma etching of metal gate TiAlC2023

    • Author(s)
      Thi-Thuy-Nga Nguyen, Kazunori Shinoda, Shih-Nan Hsiao, Hirotaka Hamamura, Kenji Maeda, Kenetsu Yokogawa, Masaru Izawa, Kenji Ishikawa, and Masaru Hori
    • Organizer
      ISPlasma2023 / IC-PLANTS2023
    • Int'l Joint Research
  • [Presentation] Etching silicon oxide, silicon nitride, and polysilicon films in CH2FCHF2 hydrofluorocarbon plasma2023

    • Author(s)
      Trung-Nguyen Tran,Thi-Thuy-Nga Nguyen,Kenji Ishikawa, Shih-Nan Hsiao,Toshio Hayashi,Makoto Sekine, and Masaru Hori
    • Organizer
      ISPlasma2023 / IC-PLANTS2023
    • Int'l Joint Research
  • [Presentation] Contribution analysis of process parameters in plasma-enhanced chemical vapor deposition of amorphous carbon2023

    • Author(s)
      Yusuke Ando, Jumpei Kurokawa, Hiroki Kondo, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine and Masaru Hori
    • Organizer
      ISPlasma2023 / IC-PLANTS2023
    • Int'l Joint Research
  • [Presentation] Characterization of plasmas and polymerized hydrofluorocarbon films in capacitively coupled CF4/H2 plasmas2023

    • Author(s)
      Yusuke Imai, Shih-Nan Hsiao, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, and Masaru Hori
    • Organizer
      ISPlasma2023 / IC-PLANTS2023
    • Int'l Joint Research
  • [Presentation] Study on plasma process using adsorbed C7F14 as an etchant2023

    • Author(s)
      Kohei Masuda,Makoto Sekine, Kenji Ishikawa, Shih-Nan Hsiao,Takayoshi Tsutsumi,Hiroki Kondo, and Masaru Hori
    • Organizer
      ISPlasma2023 / IC-PLANTS2023
    • Int'l Joint Research
  • [Presentation] Self-limited fluorination of electron-beam-irradiated GaN surface2023

    • Author(s)
      Yusuke Izumi, Takayoshi Tsutsumi, Kenji Ishikawa, Hiroki Kondo, Makoto Sekine, and Masaru Hori
    • Organizer
      ISPlasma2023 / IC-PLANTS2023
    • Int'l Joint Research
  • [Presentation] Positive and negative ion behaviors in DC-imposed Ar/SF6 pulsed plasma2023

    • Author(s)
      Kazuki Toji, Takayoshi Tsutsumi, Kenji Ishikawa, S-N. Hsaio, Makoto Sekine, and Masaru Hori
    • Organizer
      ISPlasma2023 / IC-PLANTS2023
    • Int'l Joint Research
  • [Presentation] In situ monitoring surface structure during hydrofluorocarbon assisted atomic layer etching of silicon nitride using CF4/H2 and H2 plasmas2023

    • Author(s)
      Shih-Nan Hsiao, Makoto Sekine and Masaru Hori
    • Organizer
      ISPlasma2023 / IC-PLANTS2023
    • Int'l Joint Research
  • [Presentation] Plasma medicine and plasma bio related phenomena2022

    • Author(s)
      Kenji Ishikawa
    • Organizer
      2022 MRS Spring Meeting & Exhibit
    • Int'l Joint Research / Invited
  • [Presentation] Transient Behaviors of Gaseous and Surface Reactions in a Cycle of Passivation and Etch Steps Using Ar-Based C4F8 and SF6 Plasma2022

    • Author(s)
      Kenji Ishikawa, Taito Yoshie, Takayoshi Tsutsumi, Hiroki Kondo, Makoto Sekine, and Masaru Hori
    • Organizer
      2022 MRS Spring Meeting & Exhibit
    • Int'l Joint Research
  • [Presentation] Nanoscale etching technologies for nitrides and carbides2022

    • Author(s)
      Kenji Ishikawa, Makoto Sekine, and Masaru Hori
    • Organizer
      Second Meeting of the NTC Technical Committee on Emerging Plasma Nanotechnologies
    • Int'l Joint Research / Invited
  • [Presentation] Study of etching process using CHF3 gas condensed layer in cryogenic region2022

    • Author(s)
      Kuangda Sun, Chieh-Ju Liao, Shih-Nan Hsiao, Makoto Sekine, Toshiyuki Sasaki, Chihiro Abe, Takayoshi Tsutsumi, Kenji Ishikawa, and Masaru Hori
    • Organizer
      1st International Workshop on Plasma Cryogenic Etching Processes (PlaCEP2022)
    • Int'l Joint Research
  • [Presentation] Surface Modification for Atomic Layer Etching of TiAlC Using Floating Wire-Assisted Liquid Vapor Plasma at Medium Pressure2022

    • Author(s)
      Thi-Thuy-Nga Nguyen, Kazunori Shinoda, H. Hamamura, Kenji Maeda, K. Yokogawa, Masaru Izawa, Kenji Ishikawa, and Masaru Hori
    • Organizer
      22nd Atomic layer deposition and 9th atomic layer etching workshop (ALD/ALE Workshop)
    • Int'l Joint Research
  • [Presentation] Plasma-Assisted Thermal-Cyclic Etching of Silicon Germanium Selective to Germanium2022

    • Author(s)
      Kazunori Shinoda, H. Hamamura, Kenji Maeda, Masaru Izawa, Thi-Thuy-Nga Nguyen, Kenji Ishikawa, and Masaru Hori
    • Organizer
      22nd Atomic layer deposition and 9th atomic layer etching workshop (ALD/ALE Workshop)
    • Int'l Joint Research
  • [Presentation] Area-Selective Atomic Layer Etching of SiO2 Using Silane Coupling Agent2022

    • Author(s)
      A. Osonio, Takayoshi Tsutsumi, Nagoya B. Mukherjee, R. Borude, N. Kobayashi, M. Hori
    • Organizer
      22nd Atomic layer deposition and 9th atomic layer etching workshop (ALD/ALE Workshop)
    • Int'l Joint Research
  • [Presentation] In situ monitoring hydrogen fluoride molecular density and its effects on etch selectivity of SiN over SiO2 films with hydrogen-contained fluorocarbon down-flow plasmas2022

    • Author(s)
      Shih-Nan Hsiao, Nicolay Britun, Thi-Thuy-Nga Nguyen, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, and Masaru Hori
    • Organizer
      22ND INTERNATIONAL VACUUM CONGRESS IVC-22
    • Int'l Joint Research
  • [Presentation] Machine learning and contribution analysis of radicals to the properties of hydrogenated amorphous carbon films grown by a plasma-enhanced chemical vapor deposition2022

    • Author(s)
      Hiroki Kondo, Jumpei Kurokawa, Kenji Ishikawa, Takayoshi Tsutsumi, Makoto Sekine, and Masaru Hori
    • Organizer
      22ND INTERNATIONAL VACUUM CONGRESS IVC-22
    • Int'l Joint Research
  • [Presentation] Interfacial reaction of gas-liquid plasma in the synthesis of functional carbon nanomaterials2022

    • Author(s)
      Hiroki Kondo, Takayoshi Tsutsumi, Kenji Ishikawa, and Masaru Hori
    • Organizer
      5th International Union of Material Research Societies, International Conference of Young Researchers on Advanced Materials (IUMRS-ICYRAM 2022)
    • Int'l Joint Research / Invited
  • [Presentation] Nanostructure Control and Modification of Poly(styrene-b-2-vinylpyridine) Block Copolymer in H2/N2 Plasma Process2022

    • Author(s)
      Ma. shanlene Dela Cruz DELA VEGA, Ayane KITAHARA, Thi-thuy-nga NGUYEN, Takayoshi TSUTSUMI, Atsushi TAKANO, Yushu MATSUSHITA, Masaru HORI
    • Organizer
      5th International Union of Material Research Societies, International Conference of Young Researchers on Advanced Materials (IUMRS-ICYRAM 2022)
    • Int'l Joint Research
  • [Presentation] Plasma-based in situ functionalization based on functional nitrogen science2022

    • Author(s)
      Kenji Ishikawa, Masaru Hori, and Toshiro Kaneko
    • Organizer
      11th ICRP/ 2022 GEC/ 40th SPP-40/ 35th SPSM35
    • Int'l Joint Research
  • [Presentation] Biological effects of the combination with low temperature plasmas and nanoparticles-platinum and gold2022

    • Author(s)
      Takashi Kondo, Kenji Ishikawa, Hiromasa Tanaka, Masaru Hori, Shinya Toyokuni, and Masaaki Mizuno
    • Organizer
      11th ICRP/ 2022 GEC/ 40th SPP-40/ 35th SPSM35
    • Int'l Joint Research
  • [Presentation] Achieving selective etching of SiN and SiO2 over amorphous carbon during CF4/H2 by controlling substrate temperature2022

    • Author(s)
      Shih-Nan Hsiao, Thi-Thuy-Nga Nguyen, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, and Masaru Hori
    • Organizer
      11th ICRP/ 2022 GEC/ 40th SPP-40/ 35th SPSM35
    • Int'l Joint Research
  • [Presentation] Damage mitigation in atomic layer etching of GaN by cyclic exposure of BCl3 gas and F2 added Ar plasma at high substrate temperature2022

    • Author(s)
      Shohei Nakamura, Atsushi Tanide, Masafumi Kawagoe, Soichi Nadahara, Kenji Ishikawa, Osamu Oda, and Masaru Hori
    • Organizer
      11th ICRP/ 2022 GEC/ 40th SPP-40/ 35th SPSM35
    • Int'l Joint Research
  • [Presentation] Plasma-assisted thermal-cyclic atomic-layer etching for selective removal of thin films2022

    • Author(s)
      Kazunori Shinoda, Nobuya Miyoshi, Hiroyuki Kobayashi, Masaru Izawa, Kenji Ishikawa, and Masaru Hori
    • Organizer
      11th ICRP/ 2022 GEC/ 40th SPP-40/ 35th SPSM35
    • Int'l Joint Research
  • [Presentation] Deposition mechanism of hydrogenated amorphous carbon film by C3H6/H2 mixture gas plasma2022

    • Author(s)
      Hiroki Kondo, Jumpei Kurokawa, Takayoshi Tsutsumi, Makoto Sekine, Kenji Ishikawa, and Masaru Hori
    • Organizer
      11th ICRP/ 2022 GEC/ 40th SPP-40/ 35th SPSM35
    • Int'l Joint Research
  • [Presentation] Highly efficient exosome capture by carbon nanowalls template2022

    • Author(s)
      Takumi Hashimoto, Hiroki Kondo, Hiromasa Tanaka, Kenji Ishikawa, Takayoshi Tsutsumi, Makoto Sekine, Takao Yasui, Yoshinobu Baba, Mineo Hiramatsu, and Masaru Hori
    • Organizer
      11th ICRP/ 2022 GEC/ 40th SPP-40/ 35th SPSM35
    • Int'l Joint Research
  • [Presentation] Langmuir probe and Laser Photodetachment Study of Afterglow Phase in Dual RF Frequency Pulsed Plasma Etching Processes Operated with Synchronized DC Bias2022

    • Author(s)
      Makoto Sekine, Bibhuti B Sahu, Shogo Hattori, Takayoshi Tsutsumi, Nikolay Britun, Kenji Ishikawa, Hirohiko Tanaka, Taku Gohira, Noriyasu Ohno, and Masaru Hori
    • Organizer
      11th ICRP/ 2022 GEC/ 40th SPP-40/ 35th SPSM35
    • Int'l Joint Research
  • [Presentation] Topographically-selective Atomic Layer Etching of SiO2 using fluorine-containing plasma2022

    • Author(s)
      Airah P Osonio, Takayoshi Tsutsumi, Bablu Mukherjee, Ranjit Borude, Nobuyoshi Kobayashi, and Masaru Hori
    • Organizer
      11th ICRP/ 2022 GEC/ 40th SPP-40/ 35th SPSM35
    • Int'l Joint Research
  • [Presentation] Synthesis, Functionalization, and Three-Dimensional Structuring of Carbon Nanomaterials By Gas-Liquid Interface Plasma2022

    • Author(s)
      H. Kondo, T. Tsutsumi, K. Ishikawa, M. Sekine, and M. Hori
    • Organizer
      242nd ECS Meeting
    • Int'l Joint Research / Invited
  • [Presentation] Impact of Bias Power and Oxygen Addition on Selective Dry Etching of TiAlC over TiN Using N2/H2-based Plasmas2022

    • Author(s)
      Kenji Ishikawa, Thi-Thuy-Nga Nguyen, Kazunori Shinoda, Hirotaka Hamamura, Kenji Maeda, Kenetsu Yokogawa, Masaru Izawa, and Masaru Hori
    • Organizer
      AVS 68th International Symposium & Exhibition
    • Int'l Joint Research
  • [Presentation] Selective Dry Etching of TiAlC over TiN using N2/H2 Plasma Chemistry2022

    • Author(s)
      Thi-Thuy-Nga Nguyen, Kazunori Shinoda, Hirotaka Hamamura, Kenji Maeda, Kenetsu Yokogawa, Masaru Izawa, Kenji Ishikawa, and Masaru Hori
    • Organizer
      AVS 68th International Symposium & Exhibition
    • Int'l Joint Research
  • [Presentation] Nanoscale Dry Processes for Controlling Atomic Layer Reactions and Fabrication of High-Aspect-Ratio Features2022

    • Author(s)
      Kenji Ishikawa, Thi-Thuy-Nga Nguye, Takayoshi Tsutsumi, S-N Hsaio, Makoto Sekine, and Masaru Hori
    • Organizer
      Korean International Semiconductor Conference on Manufacturing Technology 2022 (KISM 2022)
    • Int'l Joint Research / Invited
  • [Presentation] Isotropic Plasma-enhanced Atomic Layer Etching of SiO2 using F radicals and Ar plasma2022

    • Author(s)
      A.Osonio, T.Tsutsumi, B.Mukherjee, R.Borude, N.Kobayashi, M.Hori
    • Organizer
      43rd International Symposium on Dry Process Symposium (DPS 2022)
    • Int'l Joint Research
  • [Presentation] Ion Induced Damage in Plasma Enhanced Atomic Layer Etching Processing2022

    • Author(s)
      Takayoshi TSUTSUMI, Hiroki KONDO, Kenji ISHIKAWA, Makoto SEKINE, Masaru HORI
    • Organizer
      32nd Anuual Meeting on Material Researh Society of Japan (MRS-J)
    • Int'l Joint Research / Invited
  • [Presentation] Time-resolved measurement of ion energy distribution in pulsed Ar/SF6 plasma2022

    • Author(s)
      Kazuki TOJI, Kenji ISHIKAWA, Takayoshi TSUTSUMI, Shih nan HSIAO, Makoto SEKINE, Masaru HORI
    • Organizer
      32nd Anuual Meeting on Material Researh Society of Japan (MRS-J)
    • Int'l Joint Research
  • [Presentation] Plasma diagnostics and characteristics of hydrofluorocarbon films in capacitively coupled CF4/H2 plasmas2022

    • Author(s)
      Shih-Nan Hsiao, Yusuke Imai, Nicolay Britun, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori
    • Organizer
      International Symposium on Semiconductor Manufacturing (ISSM 2022)
    • Int'l Joint Research
  • [Remarks] 堀・石川研究室

    • URL

      https://horilab.nuee.nagoya-u.ac.jp/

  • [Remarks] 名古屋大学低温プラズマ科学研究センター

    • URL

      https://www.plasma.nagoya-u.ac.jp/

URL: 

Published: 2023-12-25  

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