2023 Fiscal Year Final Research Report
Growth of high-quality thin film and performance improvement of next generation high thermal conductivity material BAs
Project/Area Number |
21H01797
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Research Category |
Grant-in-Aid for Scientific Research (B)
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Allocation Type | Single-year Grants |
Section | 一般 |
Review Section |
Basic Section 29010:Applied physical properties-related
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Research Institution | Nagoya University |
Principal Investigator |
Ikuta Hiroshi 名古屋大学, 工学研究科, 教授 (30231129)
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Co-Investigator(Kenkyū-buntansha) |
浦田 隆広 名古屋大学, 工学研究科, 助教 (30780530)
飯田 和昌 日本大学, 生産工学部, 教授 (90749384)
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Project Period (FY) |
2021-04-01 – 2024-03-31
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Keywords | 硼化砒素 / BAs / 高熱伝導率薄膜 |
Outline of Final Research Achievements |
BAs is attracting attention as a novel high thermal conductivity material, since there is strong demand on materials that can efficiently discharge the heat generated by electronic devices. Here, the deposition of BAs films by molecular beam epitaxy (MBE) was studied to gain knowledge on the thin film growth of this compound. The films were deposited on various substrates under a wide range of deposition conditions. In addition to the simple co-deposition method, several growth methods were also studied, including post-annealing at high temperature after low-temperature deposition and a cap-layer deposition to prevent re-evaporation of the raw materials. In addition, film deposition of a related material, BSb, was also carried out to compare the results with that of BAs. By analyzing these thin films in detail, several insights into the relationship between the deposition conditions and the thin films were obtained.
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Free Research Field |
応用物性
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Academic Significance and Societal Importance of the Research Achievements |
電子素子の小型化・高集積化に伴って素子の発する単位面積あたりの熱量が急激に増大している。この高密度に発生する熱は、素子の誤動作や短寿命化の原因となり、信頼性低下につながるため、大きな問題となっている。その解決には、発生した熱を効率よく輩出できる、高熱伝導率材料が望まれている。最近、理論計算によりBAsの熱伝導率が非常に高いことが予想され、実験的にも検証された。しかし、BAsの結晶成長は容易ではなく、比較的小さな単結晶しか得られていない。また、薄膜はこれまで化学気相堆積法でアモルファス膜が報告されたのみである。本研究で得られた知見は、この系の薄膜成長に関する理解を進展させるものと期待される。
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