2021 Fiscal Year Annual Research Report

プラズマを援用した単結晶ダイヤモンド基板の高能率ダメージフリー研磨法の開発

Research Project

Project/Area Number	21J11028
Research Institution	Osaka University
Principal Investigator	LIU NIAN 大阪大学, 工学系研究科, 特別研究員(DC2)
Project Period (FY)	2021-04-28 – 2023-03-31
Keywords	PAP / Single crystal diamond / Damage-free / Material removal rate / Isotropic removal / Anisotropic removal / Cathodoluminescence / Raman spectroscopy
Outline of Annual Research Achievements	A single crystal diamond (SCD) substrate is processed by plasma-assisted polishing (PAP) using four types of polishing plates, the quartz glass is the most suitable to obtain an atomically smooth surface with high material removal rate. As the polishing pressure applied to the SCD substrate varied, the isotropic chemical removal action was dominant when the PAP was performed at low polishing pressures such as 62.5 kPa, whereas the anisotropic mechanically induced removal action was dominant when the PAP was performed at high polishing pressures such as 350.0 kPa. In contrast, changing the sliding speed between the polishing plate and the SCD substrate did not affect the material removal mechanism of PAP. PAP was damage-free when applied to the polishing of SCD substrate.
Research Progress Status	翌年度、交付申請を辞退するため、記入しない。
Strategy for Future Research Activity	翌年度、交付申請を辞退するため、記入しない。