Molecular design optimization of atomic oxygen resistant materials based on fluoroalkyl POSS synthesis

2023 Fiscal Year Final Research Report

• Project/Area Number: 21K04494
• Research Category: Grant-in-Aid for Scientific Research (C)
• Allocation Type: Multi-year Fund
• Section: 一般
• Review Section: Basic Section 24010:Aerospace engineering-related
• Research Institution: Japan Aerospace EXploration Agency
• Principal Investigator: Yukumatsu Kazuki 国立研究開発法人宇宙航空研究開発機構, 研究開発部門, 研究開発員 (30867966)
• Co-Investigator(Kenkyū-buntansha): 横山 創一 大阪大学, 産業科学研究所, 助教 (40811211) ; 後藤 亜希 国立研究開発法人宇宙航空研究開発機構, 研究開発部門, 研究開発員 (90794074)
• Project Period (FY): 2021-04-01 – 2024-03-31
• Keywords: 原子状酸素 / かご型シルセスキオキサン / フルオロアルキルPOSS

Outline of Final Research Achievements

Atomic oxygen (AO) in low Earth orbit collides with polymeric materials of spacecraft with a relative velocity of ~8 km/s, eroding and degrading the surface. This study focuses on polyhedral oligomeric silsesquioxane (POSS) as an AO-resistant coating and aims to clarify the effects of chemical structure of the organic units on AO resistance. Some fluoroalkyl-substituted POSS films were prepared because fluoropolymers have relatively low erosion yield in general. Interestingly, the AO resistance was not as high as that of alkyl POSS with similar chain length. In order to improve the AO resistance, it would be needed to optimize organic units for POSS considering not only the chemical composition but also the chemical structure of the POSS and the formed silica.

Free Research Field

航空宇宙工学

Academic Significance and Societal Importance of the Research Achievements

本研究では、耐AO性の高いフッ素系高分子を参考に、フルオロアルキルPOSSを合成し、AOとの反応量を評価したが、予想に反してフルオロアルキルPOSSの耐AO性が低かった。これは、有機無機ハイブリッド材料であるPOSSの耐AO性が、有機ユニットの耐AO性のみでは決定されないことを示しており、有機ユニットの適切な設計の重要性が明らかになった。これらの知見は、原子状酸素密度の大きい低地球軌道や超低地球軌道の宇宙機のための耐AO性材料設計への貢献が期待できる。