Development of 3D nanostructured zinc oxide thin film formation technology with plasma assisted process using microdroplets

2023 Fiscal Year Final Research Report

• Project/Area Number: 21K04711
• Research Category: Grant-in-Aid for Scientific Research (C)
• Allocation Type: Multi-year Fund
• Section: 一般
• Review Section: Basic Section 26050:Material processing and microstructure control-related
• Research Institution: Osaka University
• Principal Investigator: Takenaka Kosuke 大阪大学, 接合科学研究所, 准教授 (60432423)
• Project Period (FY): 2021-04-01 – 2024-03-31
• Keywords: ミストCVD

Outline of Final Research Achievements

For development of innovative semiconductor devices with greatly improved device properties through the functionality expressed by imparting to the surface interface region of oxide semiconductor materials with physical and chemical properties, the formation technology of high-quality 3D zinc oxide thin films with the desired optimal crystal structure and composition, and with a thin film structure that has an extreme specific surface area have been developed. These results suggest that radicals generated in the plasma due to the vapor supplied by the droplet contribute to the formation of zinc oxide fine particles from the droplet in the plasma, and that the droplet size in the initial plasma stage affects the shape of the fine particles.

Free Research Field

プラズマ理工学

Academic Significance and Societal Importance of the Research Achievements

微小液滴を用いてプラズマで反応を支援することにより(１)プラズマを用いた気相中での高反応場と(２)微小液滴の蒸発に起因した製膜前駆体の高速供給により、低温・高速製膜を実現でき、さらに微小液滴界面での反応により生成される材料の組成・結晶性および構造の精密制御できるプロセスはあまり例がなく独創的である。
2)本研究は従来研究には無い、プラズマという高反応場と微小液滴を用いた３次元ナノ構造形成・制御可能な独創的なプロセス開発の研究であり、次世代の新規機能性材料創成をも可能にするプロセスであり学術的な意義も高い。