• Search Research Projects
  • Search Researchers
  • How to Use
  1. Back to project page

2011 Fiscal Year Annual Research Report

プラズマバイオプロセスにおけるラジカル表面相互作用の系統的解明

Research Project

Project/Area Number 22244075
Research InstitutionOsaka University

Principal Investigator

浜口 智志  大阪大学, 大学院・工学研究科, 教授 (60301826)

Keywordsプラズマ / 表面・界面物性 / 蛋白質 / 細胞外マトリックス / PMMA / シミュレーション / イオンビーム / 大気圧プラズマ
Research Abstract

本研究では、プラズマによるバイオマテリアルプロセスや生体組織プロセスの表面反応過程やその物理化学的機構を理解するため、イオンビームシステム、プラズマビームシステム、数値シミュレーション等を用いて、有機高分子膜表面と各種イオン・ラジカル入射の相互作用を解析する。本年度は、有機高分子膜PMMA(ポリメチルメタクリレート)を水素プラズマ処理することにより、表面組成を変化され、エッチング耐性が向上することを実験的に確認した。これは、昨年度の分子動力学(MD)シミュレーション結果を確認するものであり、また、過去に知られてるプラズマ実験の結果とも定性的に合致する。また、分子動力学(MD)シミュレーションにおいては、昨年までの研究で得られるイールドデータが、実験的に知られている値よりきわめて大きなる問題があったが、これを解決するために、イオン入射中の表面状態の熱的緩和を効率的に取り入れるアルゴリズムを導入した。これにより、シミュレーションで得られるイールド値が、実験値にかなり近くなることが確認された。今後は、この手法を利用し、また、モンテカルロ法をさらに導入することにより、より精密にイールドを予想するMDシミュレーションシステムを導入する。また、本年度は、人工骨材料と知られる多孔質ハイドロキシアパタイト(HA)の酸素・ヘリウムプラズマ処理の効果と、その表面状態の研究を行った。家兎やラットにプラズマ処理した人工骨を移植する実験により、プラズマ処理が、多孔質人工骨の内部まで、の骨伝導能、骨誘導能が著しく増大することを確認し、現在、その生物学的効果とHAのプラズマ処理による表面組成の変化の関係を詳細に調べている。

Current Status of Research Progress
Current Status of Research Progress

1: Research has progressed more than it was originally planned.

Reason

当初の計画課題については、おおむね順調に進展しているが、それに加えて、本学医学部との共同研究が進展して、人工骨材料である多孔質HAのプラズマ改質に関するプラズマ表面相互作用の解析に研究が進むことができたため。

Strategy for Future Research Activity

今後も、当初の計画に沿って進めるが、特に、現在行っているMDシミュレーションの精度を高めること、および、HAとプラズマ表面相互作用の効果をより明確に解明することに注意する。

  • Research Products

    (79 results)

All 2012 2011 Other

All Journal Article (18 results) (of which Peer Reviewed: 18 results) Presentation (59 results) Remarks (1 results) Patent(Industrial Property Rights) (1 results) (of which Overseas: 1 results)

  • [Journal Article] Si damage due to oblique-angle ion impact relevant for vertical gate etching processes2012

    • Author(s)
      Tomoko Ito, Kazuhiro Karahashi, Song-Yun Kane, Satoshi Hamaguchi
    • Journal Title

      Jpn.J.Appl.Phys.

      Volume: (掲載予定)

    • Peer Reviewed
  • [Journal Article] Dependence of catalytic properties of Indium-implanted SiO2 thin films on the energy and dose of incident Indium ions2012

    • Author(s)
      S.Yoshimura, M.Kiuchi, Y.Nishimoto, M.Yasuda, A.Baba, S.Hamaguchi
    • Journal Title

      Thin Solid Films

      Volume: (掲載予定)

    • Peer Reviewed
  • [Journal Article] Sputtering yields of CaO, SrO, and BaO by monochromatic noble gas ion bombardment2012

    • Author(s)
      S.Yoshimura, K.Hine, M.Kiuchi, J.Hashimoto, M.Terauchi, Y.Honda, M.Nishitani, S.Hamaguchi
    • Journal Title

      Jpn.J.Appl.Phys.

      Volume: (掲載予定)

    • Peer Reviewed
  • [Journal Article] Low energy metal ion beam production with a modified Freeman-type ion source for development of novel catalysts2012

    • Author(s)
      S.Yoshimura, M.Kiuchi, Y.Nishimoto, M.Yasuda, A.Baba, S.Hamaguchi
    • Journal Title

      e-J.Surf.Sci.Nanotech.(2012)

      Volume: (掲載予定)

    • Peer Reviewed
  • [Journal Article] Extracellular Matrix Patterning for Cell Alignment by Atmospheric Pressure Plasma Jets2012

    • Author(s)
      Ayumi Ando, Toshifumi Asano, Md.Abu Saved, Ryugo Tero, Katsuhisa Kitano, Tsuneo Urisu, Satoshi Hamaguchi
    • Journal Title

      Jpn.J.Appl.Phys.

      Volume: 51 Pages: 036201-1-036201-7

    • Peer Reviewed
  • [Journal Article] Experimental evaluation of CaO, SrO, and BaO sputtering yields by Ne or Xe ions2011

    • Author(s)
      S.Yoshimura, K.Hine, M.Kiuchi, J.Hashimoto, M.Terauchi, Y.Honda, M.Nishitani, S.Hamaguchi
    • Journal Title

      J.Phys.D : Appl.Phys

      Volume: 44 Pages: 255203-1-255203-5

    • Peer Reviewed
  • [Journal Article] Electron density measurement of inductively coupled plasmas by terahertz time-domain spectroscopy (THz-TDS)2011

    • Author(s)
      Ayumi Ando, Tomoko Kurose, Vivien Reymond, Katsuhisa Kitano, Hideaki Kitahara, Keisuke Takano, Masahiko Tani, Masanori Hangyo, Satoshi Hamaguchi
    • Journal Title

      J.Appl.Phys.

      Volume: 110 Pages: 073303-1-073303-8

    • Peer Reviewed
  • [Journal Article] Micro pattern formation of extracellular-matrix (ECM) layers by atmospheric-pressure plasmas and cell culture on the patterned EGMs2011

    • Author(s)
      Ayumi Ando, Tomoko Kurose, Vivien Reymond, Katsuhisa Kitano, Hideaki Kitahara, Keisuke Takano, Masahiko Tani, Masanori Hangyo, Satoshi Hamaguchi
    • Journal Title

      J.Phys.D : Appl.Phys.

      Volume: 44 Pages: 482002-1-482002-5

    • Peer Reviewed
  • [Journal Article] Arrangement of PC12 cells on a silicon chip via extracellular matrix (ECM) layer patterning by atmospheric pressure plasmas2011

    • Author(s)
      Ayumi Ando, Hidetaka Uno, Toshifumi Asano, Tsuneo Urisu, Satoshi Hamaguchi
    • Journal Title

      Plasma Fusion Res.

      Volume: 6 Pages: 1306155-1-130615504

    • Peer Reviewed
  • [Journal Article] Plasma Microchannel and Jet Enhanced by an Array of Ellipsoidal Microcavities2011

    • Author(s)
      D.-S.Lee, O.Sakai, S.-J.Park, J.G.Eden, S.Hamaguchi
    • Journal Title

      IEEE Trans.Plasma Sci.

      Volume: 39 Pages: 2690-2691

    • Peer Reviewed
  • [Journal Article] Improvement of Hydrophilicity of Interconnected Porous Hydroxyapatite by Dielectric Barrier Discharge Plasma Treatment2011

    • Author(s)
      Dae-Sung Lee, Yu Moriguchi, Kiyoshi Okada, Akira Myoui, Hideki Yoshikawa, Satoshi Hamaguchi
    • Journal Title

      IEEE Trans.Plasma Sci.

      Volume: 39 Pages: 2166-2167

    • Peer Reviewed
  • [Journal Article] Dynamics of Near-Atmospheric Pressure Hydrogen Plasmas Driven by Pulsed High Voltages2011

    • Author(s)
      Chieh-Wen Lo, Satoshi Hamaguchi
    • Journal Title

      IEEE Trans.Plasma Sci

      Volume: 39 Pages: 2100-2101

    • Peer Reviewed
  • [Journal Article] Rapid Breakdown Mechanisms of Open Air Nanosecond Dielectric Barrier Discharges2011

    • Author(s)
      Tsuyohito Ito, Tatsuya Kanazawa, Satoshi Hamaguchi
    • Journal Title

      Phys.Rev.Lett.

      Volume: 107 Pages: 065002-1-065002-4

    • Peer Reviewed
  • [Journal Article] Hydrogen effects in hydrofluorocarbon plasma etching of silicon nitride : Beam study with CF^+, CF2^+, CHF_2^+, and CH_2F^+ ions2011

    • Author(s)
      Tomoko Ito, Kazuhiro Karahashi, Masanaga Fukasawa, Tetsuya Tatsumi, Satoshi Hamaguchi
    • Journal Title

      J.Vac.Sci.Technol.A

      Volume: 29 Pages: 050601-1-050601-4

    • Peer Reviewed
  • [Journal Article] Numerical analyses of hydrogen plasma generation by nanosecond pulsed high voltages at near-atmospheric pressure2011

    • Author(s)
      Chieh-Wen Lo, Satoshi Hamaguchi
    • Journal Title

      J.Phys.D : Appl.Phys.

      Volume: 44 Pages: 375201-1-375201-11

    • Peer Reviewed
  • [Journal Article] Si recess of Poly-Si Gate Etching : Damage Enhanced by Ion Assisted Oxygen Diffusion2011

    • Author(s)
      Tomoko Ito, Kazuhiro Karahashi, Masanaga Fukasawa, Tetsuya Tatsumi, Satoshi Hamaguchi
    • Journal Title

      Jpn.J.Appl.Phys.

      Volume: 50 Pages: 08KD02-1-08KD02-5

    • Peer Reviewed
  • [Journal Article] プラズマ医療におけるプラズマ生体相互作用2011

    • Author(s)
      浜口智志
    • Journal Title

      J.Plasma Fusion Res.

      Volume: 87 Pages: 696-703

    • Peer Reviewed
  • [Journal Article] 講座原子分子データベースの構築と利用:はじめに:-原子分子データベースの概要とプラズマ研究への応用-2011

    • Author(s)
      村上泉, 長壁正樹, 池田勝則, 西浦正樹, 小田昭紀, 菅原広剛, 浜口智志
    • Journal Title

      J.Plasma Fusion Res

      Volume: 88 Pages: 35-47

    • Peer Reviewed
  • [Presentation] 低エネルギーイオンビーム照射によるPMMAエッチングイールドの測定と水素プラズマ暴露のエッチングイールドへの影響2012

    • Author(s)
      吉村智
    • Organizer
      第59回応用物理学関係連合講演会
    • Place of Presentation
      早稲田大学(東京都)
    • Year and Date
      2012-03-15
  • [Presentation] 大気圧放電に接した水中における活性酸素・活性窒素種の化学反応シミュレーション2012

    • Author(s)
      金澤龍也
    • Organizer
      第59回応用物理学関係連合講演会
    • Place of Presentation
      早稲田大学(東京都)
    • Year and Date
      2012-03-15
  • [Presentation] ヘテロエピタキシャルダイヤモンド成長のためのIr(100)/MgOへの低エネルギー炭素イオン照射2012

    • Author(s)
      井谷司
    • Organizer
      第59回応用物理学関係連合講演会
    • Place of Presentation
      早稲田大学(東京都)
    • Year and Date
      2012-03-15
  • [Presentation] 水素イオン入射によるシリコン中の増速酸化プロセスの入射エネルギー依存性2012

    • Author(s)
      溝谷浩平
    • Organizer
      第59回応用物理学関係連合講演会
    • Place of Presentation
      早稲田大学(東京都)
    • Year and Date
      2012-03-15
  • [Presentation] メタノールプラズマプロセス中のイオン照射によるFeCoBエッチング反応2012

    • Author(s)
      唐橋一浩
    • Organizer
      第59回応用物理学関係連合講演会
    • Place of Presentation
      早稲田大学(東京都)
    • Year and Date
      2012-03-15
  • [Presentation] フロロカーボンイオン照射におけるSiNx:H膜中の水素の含有率の違いによるエッチング反応への影響2012

    • Author(s)
      伊藤智子
    • Organizer
      第59回応用物理学関係連合講演会
    • Place of Presentation
      早稲田大学(東京都)
    • Year and Date
      2012-03-15
  • [Presentation] Ion beam studies on plasma-surface interactions2012

    • Author(s)
      S.Hamaguchi
    • Organizer
      Semiconductor Research Corporation (SRC) & Tokyo Electron (TEL) Workshop on Future Materials and Processes for Nanotechnology
    • Place of Presentation
      Tokyo, Japan
    • Year and Date
      2012-02-17
  • [Presentation] 磁気抵抗メモリ(MRAM)高集積化のための選択性エッチング機構の解明2012

    • Author(s)
      伊藤智子
    • Organizer
      STARCフォーラム/シンポジウム2011「ライフ&グリーンイノベーション領域への挑戦」
    • Place of Presentation
      新横浜国際ホテル(神奈川)
    • Year and Date
      2012-02-01
  • [Presentation] Applications of non-equilibrium plasmas in medicine2012

    • Author(s)
      S.Hamaguchi
    • Organizer
      International Symposium for 25th Anniversary of H-mode Bifurcation Theory
    • Place of Presentation
      Fukuoka, Japan(招待講演)
    • Year and Date
      2012-01-24
  • [Presentation] Numerical analysis of silicon oxidation processes enhanced by energetic hydrogen ion injections2012

    • Author(s)
      Kohei Mizotani
    • Organizer
      The 8^<th> EU-Japan Joint Symposium on Plasma Processing
    • Place of Presentation
      Nara, Japan
    • Year and Date
      2012-01-16
  • [Presentation] Effects of Thermostat Algorithms for Cooling and Relaxation Processes in MD Simulation2012

    • Author(s)
      Keita Miyake
    • Organizer
      The 8^<th> EU-Japan Joint Symposium on Plasma Processing
    • Place of Presentation
      Nara, Japan
    • Year and Date
      2012-01-16
  • [Presentation] Etching reactions of magnetic materials (Ni, Co) in methanol plasma etching processes2012

    • Author(s)
      Kazuhiro Karahashi
    • Organizer
      The 8^<th> EU-Japan Joint Symposium on Plasma Processing
    • Place of Presentation
      Nara, Japan
    • Year and Date
      2012-01-16
  • [Presentation] Si damage by grazing ion incidence during plasma etching processes2012

    • Author(s)
      Tomoko Ito
    • Organizer
      The 8^<th> EU-Japan Joint Symposium on Plasma Processing
    • Place of Presentation
      Nara, Japan
    • Year and Date
      2012-01-16
  • [Presentation] Low-energy carbon-ion injection into Ir(100)/MgO for hetero-epitaxial growth of diamond2012

    • Author(s)
      T.Itani
    • Organizer
      The 8^<th> EU-Japan Joint Symposium on Plasma Processing
    • Place of Presentation
      Nara, Japan
    • Year and Date
      2012-01-16
  • [Presentation] Low energy mass-selected metal ion beam production with a modified Freeman-type ion source2012

    • Author(s)
      Y.Yoshimura
    • Organizer
      The 8^<th> EU-Japan Joint Symposium on Plasma Processing
    • Place of Presentation
      Nara, Japan
    • Year and Date
      2012-01-16
  • [Presentation] Trapping of hydrogen in silicon near the surface resulting from simultaneous bombardment of argon and hydrogen ions2012

    • Author(s)
      C.Thomas
    • Organizer
      The 8^<th> EU-Japan Joint Symposium on Plasma Processing
    • Place of Presentation
      Nara, Japan
    • Year and Date
      2012-01-16
  • [Presentation] Mass-selected ion beam system for the study of beam-surface inter action2012

    • Author(s)
      Hu Li
    • Organizer
      The 8^<th> EU-Japan Joint Symposium on Plasma Processing
    • Place of Presentation
      Nara, Japan
    • Year and Date
      2012-01-16
  • [Presentation] Arrangement of PC12 cells on extracellular matrix (ECM) layers patterned by atmospheric pressure plasmas2012

    • Author(s)
      Ayumi Ando
    • Organizer
      The 8^<th> EU-Japan Joint Symposium on Plasma Processing
    • Place of Presentation
      Nara, Japan
    • Year and Date
      2012-01-16
  • [Presentation] Zero-Dimensional Reaction Simulations of Reactive Oxygen Species in Water2012

    • Author(s)
      Tatsuya Kanazawa
    • Organizer
      The 8^<th> EU-Japan Joint Symposium on Plasma Processing
    • Place of Presentation
      Nara, Japan
    • Year and Date
      2012-01-16
  • [Presentation] Molecular dynamic simulation for enhancement of Si_3N_4/SiO_2 etching selectivity by incorporation of hydrogen in fluorocarbon-based plasmas2012

    • Author(s)
      Ryota Shigekawa
    • Organizer
      The 8^<th> EU-Japan Joint Symposium on Plasma Processing
    • Place of Presentation
      Nara, Japan
    • Year and Date
      2012-01-16
  • [Presentation] Plasma-Tissue Interaction-Roles of Bio-interfaces in Plasma Medicine2011

    • Author(s)
      S.Hamaguchi
    • Organizer
      21st Material Research Society Japan
    • Place of Presentation
      Yokohama, Japan(招待講演)
    • Year and Date
      2011-12-19
  • [Presentation] Extracellular matrix (ECM) patterning by atmospheric-pressure plasmas for arranging neuronal cells on silicon substrates2011

    • Author(s)
      Ayumi Ando
    • Organizer
      Plasma Conference 2011
    • Place of Presentation
      Kanazawa, Japan(招待講演)
    • Year and Date
      2011-11-22
  • [Presentation] Study of plasma-surface reactions by a multi beam system2011

    • Author(s)
      Kazuhiro Karahashi
    • Organizer
      Plasma Conference 2011
    • Place of Presentation
      Kanazawa, Japan(招待講演)
    • Year and Date
      2011-11-22
  • [Presentation] Etching reactions of magnetic thin films by ion irradiation Etching reactions of magnetic thin films by ion irradiation2011

    • Author(s)
      Tomoko Ito
    • Organizer
      Plasma Conference 2011
    • Place of Presentation
      Kanazawa, Japan
    • Year and Date
      2011-11-22
  • [Presentation] 新しいプラズマ科学技術:ライフイノベーションへの挑戦:イントロダクション2011

    • Author(s)
      浜口智志
    • Organizer
      Plasma Conference 2011
    • Place of Presentation
      石川県立音楽堂(金沢市)
    • Year and Date
      2011-11-22
  • [Presentation] Enhancement of hydrogen trapping by heavier ion bombardment in silicon (111) surfaces2011

    • Author(s)
      C.Thomas
    • Organizer
      64th Annual Gaseous Electronics Conference
    • Place of Presentation
      Salt Lake City, Utah, USA
    • Year and Date
      2011-11-14
  • [Presentation] Laser electric field measurement in open-air dielectric barrier discharges2011

    • Author(s)
      Tsuyohito Ito
    • Organizer
      64th Annual Gaseous Electronics Conference
    • Place of Presentation
      Salt Lake City, Utah, USA
    • Year and Date
      2011-11-14
  • [Presentation] Low energy mass-selected metal ion beam production with a modifled Freeman-type ion source for the development of novel catalysts2011

    • Author(s)
      S.Yoshimura
    • Organizer
      6^<th> International Symposium on Surface Science and Nanotechnology
    • Place of Presentation
      Tokyo Japan
    • Year and Date
      2011-11-11
  • [Presentation] Etching reactions of Ni and Ta films by CO^+, C^+, O^+ and OH^+ ion irradiation2011

    • Author(s)
      Kazuhiro Karahashi
    • Organizer
      The 33nd International Symposium on Dry Process
    • Place of Presentation
      Kyoto, Japan
    • Year and Date
      2011-11-10
  • [Presentation] Si damage due to oblique-angle icm impact relevant for vertical gate etching processes2011

    • Author(s)
      Tomoko Ito
    • Organizer
      The 33nd International Symposium on Dry Process
    • Place of Presentation
      Kyoto, Japan
    • Year and Date
      2011-11-10
  • [Presentation] Enhancement of Si_3N_4/SiO_2 etching selectivity by incorporation of hydrogen in fluorocarbon-based plasmas : comparison of numerical simul ation with beam experiments2011

    • Author(s)
      Ryota Shigekawa
    • Organizer
      The 33nd International Symposium on Dry Process
    • Place of Presentation
      Kyoto, Japan
    • Year and Date
      2011-11-10
  • [Presentation] Measurement of MgO, CaO, SrO, and BaO sputtering yields by noble gas ions for plasma display panel cells2011

    • Author(s)
      S.Yoshimura
    • Organizer
      The 33nd International Symposium on Dry Process
    • Place of Presentation
      Kyoto, Japan
    • Year and Date
      2011-11-10
  • [Presentation] Optimization and characterization of surface properties of interconnected porous hydroxyapatite via plasma treatment2011

    • Author(s)
      D.-S.Lee
    • Organizer
      The 33nd International Symposium on Dry Process
    • Place of Presentation
      Kyoto, Japan
    • Year and Date
      2011-11-10
  • [Presentation] Plasma Surface Treatment of Artificial Bones and its Application to Regenerative Medicine2011

    • Author(s)
      S.Hamaguchi
    • Organizer
      8th International Conference on Flow Dynamics
    • Place of Presentation
      Sendai, Japan(招待講演)
    • Year and Date
      2011-11-09
  • [Presentation] Ion beam studies on plasma-surface interactions2011

    • Author(s)
      S.Hamaguchi
    • Organizer
      Semiconductor Research Corporation (SRC) CEMPI Back End Processes Review
    • Place of Presentation
      Denton, TX, USA
    • Year and Date
      2011-11-07
  • [Presentation] Mechanisms of selective etching for magnetic materials : Ni, Co and Ta etching by carbon monoxide/methyl alcohol based plasmas2011

    • Author(s)
      Kazuhiro Karahashi
    • Organizer
      American Vacuum Society 58th International Symposium & Exhibition
    • Place of Presentation
      Nashville, USA
    • Year and Date
      2011-10-30
  • [Presentation] Characteristics of silicon nitride etching by reactive plasmas containing CHxFy ions2011

    • Author(s)
      Tomoko Ito
    • Organizer
      American Vacuum Society 58th International Symposium & Exhibition
    • Place of Presentation
      Nashville, USA
    • Year and Date
      2011-10-30
  • [Presentation] Numerical Simulation of Enhanced Oxygen Diffusion in Silicon as a Cause of Si Recess2011

    • Author(s)
      Kohei Mizotani
    • Organizer
      American Vacuum Society 58th International Symposium & Exhibition
    • Place of Presentation
      Nashville, USA
    • Year and Date
      2011-10-30
  • [Presentation] Molecular dynamic simulation for selective etching of silicon nitride and silicon oxide by hydrofluorocarbon ions2011

    • Author(s)
      Ryota Shigekawa
    • Organizer
      American Vacuum Society 58th International Symposium & Exhibition
    • Place of Presentation
      Nashville, USA
    • Year and Date
      2011-10-30
  • [Presentation] Recent development of plasma medicine2011

    • Author(s)
      S.Hamaguchi
    • Organizer
      2011 Northeastern Asian Symposium on Plasma Fusion
    • Place of Presentation
      Daejeon, Korea(招待講演)
    • Year and Date
      2011-09-25
  • [Presentation] Molecular dynamics (MD) simulation for semiconductor nanotechnology2011

    • Author(s)
      S.Hamaguchi
    • Organizer
      International Symposium on Renewable Energy & Materials Tailoring
    • Place of Presentation
      Kyoto, Japan(招待講演)
    • Year and Date
      2011-09-18
  • [Presentation] Ionization-front propagation in nano-second pulsed plasmas near atmospheric pressure : analyses by particle-in-cell (PIC) simulation2011

    • Author(s)
      S.Hamaguchi
    • Organizer
      the 22nd International Conference on Numerical Simulation of Plasmas
    • Place of Presentation
      Long Branch, NJ.USA(招待講演)
    • Year and Date
      2011-09-07
  • [Presentation] プラズマ医療の現状と課題2011

    • Author(s)
      浜口智志
    • Organizer
      第885回Technical Seminar
    • Place of Presentation
      総評会館(東京)(招待講演)
    • Year and Date
      2011-08-31
  • [Presentation] HCl^+,HB^+およびSiCl_x^+イオン照射によるSiエッチング反応の評価2011

    • Author(s)
      伊藤智子
    • Organizer
      第72回応用物理学術講演会
    • Place of Presentation
      山形大学
    • Year and Date
      2011-08-29
  • [Presentation] メタノールプラズマエッチングプロセス中のイオン照射によるNi薄膜酸化過程の解析2011

    • Author(s)
      唐橋一浩
    • Organizer
      第72回応用物理学術講演会
    • Place of Presentation
      山形大学
    • Year and Date
      2011-08-29
  • [Presentation] 水素イオン入射によるシリコン中の増速酸化プロセスの数値解析2011

    • Author(s)
      溝谷浩平
    • Organizer
      第72回応用物理学術講演会
    • Place of Presentation
      山形大学
    • Year and Date
      2011-08-29
  • [Presentation] 低圧誘電体バリア放電プラズマ処理による連通多孔体ハイドロキシアパタイトの効果的表面改質2011

    • Author(s)
      Daesung Lee
    • Organizer
      第72回応用物理学術講演会
    • Place of Presentation
      山形大学
    • Year and Date
      2011-08-29
  • [Presentation] 大気圧プラズマによる培養液中の長寿命ラジカル生成と細胞増殖効果2011

    • Author(s)
      増田一仁
    • Organizer
      第72回応用物理学術講演会
    • Place of Presentation
      山形大学
    • Year and Date
      2011-08-29
  • [Presentation] SiNエッチングにおける水素反応:分子動力学シミュレーション解析2011

    • Author(s)
      重川遼太
    • Organizer
      第72回応用物理学術講演会
    • Place of Presentation
      山形大学
    • Year and Date
      2011-08-29
  • [Presentation] インジウム照射SiO2基板の触媒効果の入射エネルギー依存性2011

    • Author(s)
      吉村智
    • Organizer
      第72回応用物理学術講演会
    • Place of Presentation
      山形大学
    • Year and Date
      2011-08-29
  • [Presentation] Plasma medicine in orthopaedics2011

    • Author(s)
      S.Hamaguchi
    • Organizer
      the 1st International Symposium for Plasma Biosciences
    • Place of Presentation
      Seul, Korea(招待講演)
    • Year and Date
      2011-08-14
  • [Presentation] Dielectric barrier discbarge plasma treatment of biomaterial surfaces for orthopaedic applications2011

    • Author(s)
      D.-S.Lee
    • Organizer
      the 1st International Symposium for Plasma Biosciences
    • Place of Presentation
      Seul, Korea
    • Year and Date
      2011-08-14
  • [Presentation] Patterning of an extracellular matrix (ECM) layer on silicon by atmos pheric-pressure plasmas for living neuron network chip fabrication2011

    • Author(s)
      Ayumi Ando
    • Organizer
      The 20th International Symposium on Plasma Chemistry
    • Place of Presentation
      Philadelphia, USA
    • Year and Date
      2011-07-24
  • [Presentation] Plasma Irradiation Effects on Cells, Tissues, and Biomaterials in Orthopaedic Applications2011

    • Author(s)
      Kazuto Masuda
    • Organizer
      The 20th International Symposium on Plasma Chemistry
    • Place of Presentation
      Philadelphia, USA
    • Year and Date
      2011-07-24
  • [Presentation] Particle-in-cell (PIC) simulation analysis of the ionization-front propagation in the formation phase of a nano-second pulsed atmospheric-pressure hydrogen plasma2011

    • Author(s)
      Satoshi Hamaguchi
    • Organizer
      The 20th International Symposium on Plasma Chemistry
    • Place of Presentation
      Philadelphia, USA
    • Year and Date
      2011-07-24
  • [Presentation] Helium-Oxygen Plasma Treatment of Interconnected Porous Hydroxya patite as a Material for Artificial Bones2011

    • Author(s)
      Dae-Sung Lee
    • Organizer
      the 24th Symposium on Plasma Science for Materials
    • Place of Presentation
      Osaka, Japan
    • Year and Date
      2011-07-19
  • [Presentation] Hydrogen trapping enhanced by ion induced damages in silicon2011

    • Author(s)
      C.Thomas
    • Organizer
      the 3rd International Conference on Microelectronics and Plasma Technology
    • Place of Presentation
      Dalian, China
    • Year and Date
      2011-07-04
  • [Presentation] Discharge Formation Mechanisms of Nano-Second High-Pressure Hydrogen Discharges2011

    • Author(s)
      S.Hamaguchi
    • Organizer
      the 3rd International Conference on Microelectronics and Plasma Technology
    • Place of Presentation
      Dalian, China
    • Year and Date
      2011-07-04
  • [Presentation] カーボン堆積膜の密着性解析2011

    • Author(s)
      松隈正明
    • Organizer
      第1回マルチスケールマテリアルモデリングシンポジウム・第16回分子動力学シンポジウム
    • Place of Presentation
      大阪大学
    • Year and Date
      2011-05-23
  • [Remarks]

    • URL

      http://www.camt.eng.osaka-u.ac.jp/hamaguchi/

  • [Patent(Industrial Property Rights)] 人工骨、人工骨製造装置及び人工骨製造方法2011

    • Inventor(s)
      浜口智志、森口悠、増田一仁、岡田潔、名井陽、吉川秀樹、李大成
    • Industrial Property Rights Holder
      国立大学法人大阪大学
    • Industrial Property Number
      PCT/JP2011/071262
    • Filing Date
      2011-09-16
    • Overseas

URL: 

Published: 2013-06-26  

Information User Guide FAQ News Terms of Use Attribution of KAKENHI

Powered by NII kakenhi