2012 Fiscal Year Final Research Report
Study on nanoscale chemical reactions and reaction sites using quantum beams
| Project/Area Number |
22246128
|
|---|
| Research Category |
Grant-in-Aid for Scientific Research (A)
|
| Allocation Type | Single-year Grants |
|---|
| Section | 一般 |
|---|
| Research Field |
Nuclear engineering
|
|---|
| Research Institution | Osaka University |
|---|
Principal Investigator |
|
|---|
| Co-Investigator(Kenkyū-buntansha) |
YANG Jinfeng 大阪大学, 産業科学研究所, 准教授 (90362631)
KOBAYASHI Kazuo 大阪大学, 産業科学研究所, 助教 (30116032)
YAMAMOTO Hiroki 大阪大学, 産業科学研究所, 助教 (00516958)
|
|---|
| Project Period (FY) |
2010 – 2012
|
| Keywords | 放射線 / X 線 / 粒子線 / 半導体超微細化 / シミュレーション工学 / 計算物理 |
|---|
| Research Abstract |
In the high-volume production lines of semiconductor devices, high-resolution and high-throughput manufacturing has been achieved through the combination of expensive high-quality quantum beam and inexpensive low-quality thermal energy. In this study, nanoscale chemical reactions and reaction sites were investigated by using state-of-the-art quantum beams such as electron beam, laser, extreme ultraviolet (EUV) radiation, and X-ray. On the basis of the obtained knowledge, Monte Carlo simulation code was developed.
|
-
-
-
-
-
-
-
[Journal Article] Effect of Ultrahigh-Density Ionization of Resist Films on Sensitivity Using Extreme-Ultraviolet Free-Electron Laser2012
Author(s)
K. Okamoto, T. Kozawa, K. Oikawa, T. Hatsui, M. Nagasono, T. Kameshima, T. Togashi, K. Tono, M. Yabashi, H. Kimura, Y. Senba, H. Ohashi, R. Fujiyoshi, and T. Sumiyoshi
-
Journal Title
Appl. Phys. Express
Volume: 5巻
Pages: 096701
DOI
Peer Reviewed
-
-
-
-
-
-
-
-
-
-
-
-
-
-
