2012 Fiscal Year Final Research Report
Growth of high phase purity cubic III-nitride semiconductor thin films and application of their heterostructures
| Project/Area Number |
22360005
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| Research Category |
Grant-in-Aid for Scientific Research (B)
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| Allocation Type | Single-year Grants |
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| Section | 一般 |
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| Research Field |
Applied materials science/Crystal engineering
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| Research Institution | The University of Tokyo |
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Principal Investigator |
ONABE Kentaro 東京大学, 大学院・新領域創成科学研究科, 教授 (50204227)
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| Co-Investigator(Renkei-kenkyūsha) |
YAGUCHI Hiroyuki 埼玉大学, 大学院・理工学研究科, 教授 (50239737)
KATAYAMA Ryuji 東北大学, 金属材料研究所, 准教授 (40343115)
KUBOYA Shigeyuki 東京大学, 大学院・新領域創成科学研究科, 助教 (70583615)
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| Research Collaborator |
SAKUNTAM Sanorpim チュラロンコン大学(タイ), 理学部, 助教授
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| Project Period (FY) |
2010 – 2012
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| Keywords | エピタキシャル成長 |
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| Research Abstract |
High cubic phase purity films and their hetero-structures of III-nitride semiconductors including GaN, InN, AlN and related alloys have been realized using metalorganic vapor phase epitaxy or molecular beam epitaxy. Their basic physical properties such as phase purity, defect nature, luminescence and electrical conduction have been clarified in relation with the growth conditions. In particular, the usefulness of YSZ(001) substrates for cubic InN and InGaN films, conductivity control by Si doping to cubic GaN and AlGaN films, and the bandgap value for cubic AlN are established.
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Research Products
(31 results)
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[Presentation]2012
Author(s)
角田雅弘,森川生,窪谷茂幸,片山竜二,尾鍋研太郎
Organizer
第4回窒化物半導体結晶成長講演会
Place of Presentation
東京大学(東京)
Year and Date
2012-04-27
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