Resist pattern replication using EUV interference lithography for 20 nm and below

2012 Fiscal Year Final Research Report

• Project/Area Number: 22360146
• Research Category: Grant-in-Aid for Scientific Research (B)
• Allocation Type: Single-year Grants
• Section: 一般
• Research Field: Electron device/Electronic equipment
• Research Institution: University of Hyogo
• Principal Investigator: WATANABE Takeo 兵庫県立大学, 高度産業科学技術研究所, 准教授 (70285336)
• Co-Investigator(Kenkyū-buntansha): KINOSHITA Hiroo 兵庫県立大学, 高度産業科学技術研究所, 教授 (50285334) ; HARADA Tetsuo 兵庫県立大学, 高度産業科学技術研究所, 助授 (30451636)
• Research Collaborator: SHIONO Daiju 東京応化工業株式会社
• Project Period (FY): 2010 – 2012
• Keywords: 微細プロセス技術 / 極端紫外線リソグラフィ / 干渉露光 / レジスト

Research Abstract

Resist pattern of 15 nm line and space was replicated using EUV interference lithographic tool which was developed at the BL9B beamline of the NewSUBARU synchrotron radiation facility. The fabrication of the transmission grating for 1X nm resist pattern replication was succeeded. Furthermore, the resist chemical reaction study for increasing sensitivity and decreasing line width roughness, base resin selection of polymer and monomer, and photoacid generator selection were carried out.

Research Products

• [Journal Article] Chemical Reaction Analysis of EUV CA Resist using SR Absorption Spectroscopy (2012)
  • Author(s): Takeo Watanabe, Yuichi Haruyama, Daiju Shiono, Kazuya Emura, Takuro Urayama, Tetsuo Harada, and Hiroo Kinoshita
  • Journal Title: J. Photopolymer Sci. Technol. Volume: 25 Pages: 569-574
  • URL: http://www.photoplolymer.org
  • Peer Reviewed
• [Journal Article] Extreme Ultraviolet (EUV)-Resist Material Based on Noria (Water Wheel-like Macrocycle) Derivatives with Pendant Alkoxyl and Adamantyl Ester Groups (2012)
  • Author(s): Hiroto Kudo, Nobumitsu Niina, Tomoharu Sato, Hiroaki Oizumi, Toshiro Itani, Takuro Miura, Takeo Watanabe and Hiroo Kinoshita
  • Journal Title: J. Photopolymer Sci. Technol. Volume: 25 Pages: 587-592
  • URL: http://www.photoplolymer.org
  • Peer Reviewed
• [Journal Article] Comparison of Resist Outgassing Characterization between High Power EUV and EB (2012)
  • Author(s): Norihiko Sugie, Toshiya Takahashi, Kazuhiro Katayama, Isamu Takagi, Yukiko Kikuchi, Eishi Shiobara, Hiroyuki Tanaka, Soichi Inoue, Takeo Watanabe, Tetsuo Harada and Hiroo Kinoshita
  • Journal Title: J. Photopolymer Sci. Technol. Volume: 25 Pages: 617-624
  • URL: http://www.photoplolymer.org
  • Peer Reviewed
• [Journal Article] EUV リソグラフィ研究開発センターにおけるリソグラフィ開発 (2012)
  • Author(s): 渡邊健夫、原田哲男、木下博雄
  • Journal Title: クリーンテクノロジー Volume: 22 Pages: 1-5
• [Journal Article] Development of interference lithography for 22 nm node and below (2011)
  • Author(s): Yasuyuki Fukushima, Yuya Yamaguchi, Takafumi Iguchi, Takuro Urayama, Tetsuo Harada, Takeo Watanabe and Hiroo Kinoshita
  • Journal Title: Microelectric Engineering Volume: 88 Pages: 1944-1947
  • Peer Reviewed
• [Journal Article] Transmission Grating Fabrication for Replicating Resist Patterns of 20 nm and Below (2011)
  • Author(s): Yuya Yamaguchi, Yasuyuki Fukushima, Takeo Watanabe, Tetsuo Harada, and Hiroo Kinoshita
  • Journal Title: Jpn. J. Appl. Phys. Volume: 50 Pages: 06GB10-1, 06GB10-1-4
  • Peer Reviewed
• [Journal Article] In-situ Contamination Thickness Measurement by Novel Resist Evaluation System at NewSUBARU (2011)
  • Author(s): Naohiro Matsuda, Takeo Watanabe, Tetsuo Harada, Hiroo Kinoshita, Hiroaki Oizumi, and Toshiro Itani
  • Journal Title: Jpn. J. Appl. Phys. Volume: 50 Pages: 06GB02-1, 06GB02-04
  • Peer Reviewed
• [Journal Article] EUV Interference Lithography for 1X nm (2011)
  • Author(s): Takuro Urayama, Takeo Watanabe, Yuya Yamaguchi, Naohiro Matsuda, Yasuyuki Fukushima, Takafumi Iguchi, Tetsuo Harada, and Hiroo Kinoshita
  • Journal Title: J. Photopolymer Sci. Technol. Volume: 23 Pages: 681-686
  • URL: http://www.photoplolymer.org
  • Peer Reviewed
• [Journal Article] elationships between EUV resist outgassing and contamination deposition at Selete (2011)
  • Author(s): Hiroaki Oizumi, Kazuyuki Matsumaro, Satoshi Nomura, Julius Joseph Santillan, Toshiro Itani, Takeo Watanabe, Naohiro Matsuda, Tetsuo Harada, and Hiroo Kinoshita
  • Journal Title: Proc. SPIE Volume: 7969 Pages: 796921-1, 796921-10
• [Journal Article] Development of Extreme Ulytaviolet Interference Lithography System (2010)
  • Author(s): Y. Fukushima, Naqoki. Sakagami, Teruhiko Kimura, Yoshito Kamaji, Takafumi Iguchi, Y. Yamaguchi, Masaki Tada, Tetsuo Harada, Takeo Watanabe, and Hiroo Kinoshita
  • Journal Title: Jpn. J. Appl. Phys. Volume: 49 Pages: 06GD06-1, 06GD06-5
  • Peer Reviewed
• [Journal Article] Decomposition and Roughness Analysis of Chemically Amplified Molecular Resist for Reducing LWR (2010)
  • Author(s): Daiju Shiono, Hideo Hada, Kazufumi Sato, Yasuyuki Fukushima, Takeo Watanabe, and Hiroo Kinoshita
  • Journal Title: Jpn. J. Appl. Phys. Volume: 49 Pages: 06GF05-1, 06GF05-5
  • Peer Reviewed
• [Journal Article] Fabrication process of EUV -IL transmission grating (2010)
  • Author(s): Yuya Yamaguchi, Yakusyuki Fukushima, Takafumi Iguchi, Hiroo Kinoshita, Tetsuo Harada, and Takeo Watanabe
  • Journal Title: J. Photopolymer Sci. Technol. Volume: 23 Pages: 681-386
  • URL: http://www.photoplolymer.org
  • Peer Reviewed
• [Journal Article] EUV interference lithography for 22 nm node and below (2010)
  • Author(s): Yasuyuki Fukushima, Yuya Yamaguchi, Teruhiko Kimura, Takafumi Iguchi, Tetsuo Harada, Takeo Watanabe, and Hiroo Kinoshita
  • Journal Title: J. Photopolymer Sci. Technol. Volume: 23 Pages: 673-680
  • URL: http://www.photoplolymer.org
  • Peer Reviewed
• [Journal Article] Fundamental Decomposition Analysis of Chemically Amplified Molecular Resist for below 22 nm Resolution (2010)
  • Author(s): aiju Shiono, Hideo Hada, Kazufumi Sato, Yasuyuki Fukushima, Takeo Watanabe, and Hiroo Kinoshita
  • Journal Title: J. Photopolymer Sci. Technol. Volume: 23 Pages: 649-656
  • URL: http://www.photoplolymer.org
  • Peer Reviewed
• [Journal Article] EUVレジスト材料開発の現状と将来展望について、先端リソグラフィの展望 (2010)
  • Author(s): 渡邊健夫、木下博雄
  • Journal Title: 第19回光反応・電子用材料研究会講座 講演予稿集、高分子学会 Pages: 14-17
  • Peer Reviewed
• [Presentation] Recent Activities on EUVL in NewSUBARU (Invited talk) (2012)
  • Author(s): Hiroo Kinoshia, Takeo Watanabe, and Tetsuo Harada
  • Organizer: 24th Microprocesses and Nanotechnology Conference
  • Place of Presentation: Kobe Meriken Park Oriental Hotel, Kobe, Hyogo, Japan
  • Year and Date: 20121020-1102
• [Presentation] 極端紫外線リソグラフィ技術開発の現状と今後の展望(招待講演) (2012)
  • Author(s): 渡邊健夫、原田哲男、木下博雄
  • Organizer: リソグラフィセミナー(I)、セミフォーラムジャパン2012
  • Place of Presentation: グランキューブ大阪(大阪市)
  • Year and Date: 20120613-14
• [Presentation] EUVL 研究開発センターにおけるEUV レジストの開発(基調講演)、アドバンスト・テクノロジー・プログラム(ATP)、新材料開発最前線、微細パターン化技術 (2012)
  • Author(s): 渡邊健夫、原田哲男、木下博雄
  • Organizer: 日本化学会第93春季年会(2013)
  • Place of Presentation: 立命館大学びわこ・くさつキャンパス
  • Year and Date: 20120322-25
• [Presentation] Contamination Evaluation Tool by an In-situ Spectroscopic Ellipsometer with an Exposure of High Power EUV (Invited talk) (2012)
  • Author(s): Takeo Watanabe, Masaki Tada, Yukiko Kikuchi, Toshiya Takahashi, Kazuhiro Katayama, Norihiko Sugie, Isamu Takagi, Eishi Shiobara, Hiroyuki Tanaka, Soichi Inoue, Tetsuo Harada, and Hiroo Kinoshita
  • Organizer: Technical Working Group of EUV Resist Outgassing
  • Place of Presentation: Brussels Convention Center, Brussels, Belgium
  • Year and Date: 2012-09-30
• [Presentation] EUV Interference Lithography for 1X nm (2011)
  • Author(s): Takeo Watanabe, Yuya Yamaguchi, Takuro Urayama, Naohiro Matsuda, Tetsu Harada and Hiroo Kinosita
  • Organizer: 2011 International Workshop on EUV Lithography
  • Place of Presentation: Makena Beach and Golf Resort, Maui, Hawaii, USA
  • Year and Date: 20110713-17
• [Presentation] EUV Interference Lithography for 1X nm (2011)
  • Author(s): Takuro Urayama, Takeo Watanabe, Yuya Yamaguchi, Naohiro Matsuda, Yasuyuki Fukushima, Takafumi Iguchi, Tetsuo Harada, and Hiroo Kinoshita
  • Organizer: The 28th International Conference ofPhotopolymer Science and Technology
  • Place of Presentation: Chiba Univ., Japan
  • Year and Date: 20110621-0726
• [Presentation] EUVL toward 16 nm and below (Invited), Interational Panel Symposium (2011)
  • Author(s): Takeo Watanabe
  • Organizer: The 28th International Conference of Photopolymer Science and Technology
  • Place of Presentation: Chiba Univ., Japan
  • Year and Date: 20110621-0724
• [Presentation] EUVL研究開発センターにおける研究開発(招待講演) 、微細化ブレイクセミナー(I) (2011)
  • Author(s): 渡邊健夫
  • Organizer: セミフォーラムジャパン2011
  • Place of Presentation: グランキューブ大阪(大阪市)
  • Year and Date: 20110531-0601
• [Presentation] EUV リソグラフィ-研究開発センターにおけるリソグラフィー開発(招待講演)、アドバンスト・テクノロジー・プログラム(ATP) (2011)
  • Author(s): 渡邊健夫、 原田哲男、 木下博雄
  • Organizer: 次世代リソグラフィ、日本化学会第91 春季年会
  • Place of Presentation: 神奈川大学(神奈川)
  • Year and Date: 20110326-29
• [Presentation] EUVレジストの開発 ～20nm以下のパターン形成をめざして～ (招待講演) (2011)
  • Author(s): 渡邊健夫
  • Organizer: 第3回リソグラフィ次世代技術調査専門委員会
  • Place of Presentation: 日本交通協会 特別談話室、東京
  • Year and Date: 2011-09-16
• [Presentation] Fabrication process of EUV-IL transmission grating (2010)
  • Author(s): Yuya Yamaguchi, Yakusyuki Fukushima, Takafumi Iguchi, Hiroo Kinoshita, Tetsuo Harada, and Takeo Watanabe
  • Organizer: The 27th International Conference of Photopolymer Science and Technology
  • Place of Presentation: Chiba Univ., Japan
  • Year and Date: 20100622-0725
• [Presentation] EUV interference lithography for 22 nm node and below (2010)
  • Author(s): Yasuyuki Fukushima, Yuya Yamaguchi, Teruhiko Kimura, Takafumi Iguchi, Tetsuo Harada, Takeo Watanabe, and Hiroo Kinoshita
  • Organizer: The 27th International Conference of Photopolymer Science and Technology
  • Place of Presentation: Chiba Univ., Japan
  • Year and Date: 20100622-0725
• [Book] レジストプロセスの最適化テクニック、～微細化・トラブル解消のための工程別対策および材料技術～ (2011)
  • Author(s): 渡邊健夫
  • Total Pages: 557
  • Publisher: 情報機構
• [Remarks]
  • URL: http://www.lasti.u-hyogo.ac.jp/sr-nanotechnology/index.html