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2012 Fiscal Year Final Research Report

Fabrication of photovoltaic cells using amorphous carbon films

Research Project

  • PDF
Project/Area Number 22360302
Research Category

Grant-in-Aid for Scientific Research (B)

Allocation TypeSingle-year Grants
Section一般
Research Field Material processing/treatments
Research InstitutionTokyo Institute of Technology

Principal Investigator

OHTAKE Naoto  東京工業大学, 大学院・理工学研究科, 教授 (40213756)

Project Period (FY) 2010 – 2012
Keywordsプラズマ処理・レーザー加工 / アモルファス炭素 / 太陽電池
Research Abstract

This report describes fabrication of doped amorphous carbon films and its application to photovoltaic cells. Pulse magnetron sputtering method was used to deposit amorphous carbon films. Nitrogen, antimony and boron were used as the dopants, because nitrogen and antimony are 15-group elements, and boron is 13-group element. Annealing process was utilized to reduce defect density of amorphous carbon films. Deposited films were annealed under Ar and H2 plasma atmosphere. Annealed amorphous carbon films with antimony of 1.0 [mol%] under H2 plasma atmosphere at 900 [℃] showed band gap of 2.63 [eV] and dangling bond density of as low as 3.0×10^16 [cm-3]. This value is as same as amorphous silicon films. Finally, photovoltaic cell consisting of amorphous carbon was fabricated. It was found that the cell generates Voc of 20~49.0 mV,and Isc of0.01uA.

  • Research Products

    (8 results)

All 2012 2011 2010 Other

All Journal Article (1 results) Presentation (7 results)

  • [Journal Article] Hiroki Akasaka and Naoto Ohtake: Synthesis of Antimony Doped Amorphous Carbon Films

    • Author(s)
      Hiroaki Okuyama,Mai Takashima
    • Journal Title

      Journal of Physics: Conference Series

  • [Presentation] アダマント薄膜の合成と太陽光発電素としての評価2012

    • Author(s)
      齋藤啓,奥山紘章,赤坂大樹,大竹尚登.
    • Organizer
      第20回機械材料・材料加工技術講演会
    • Place of Presentation
      大阪工業大学(大阪)
    • Year and Date
      20121100
  • [Presentation] Synthesis of Antimony Doped Amorphous Carbon Films2012

    • Author(s)
      Hiroaki Okuyama, Mai Takashima, Hiroki Akasaka, Naoto Ohtake
    • Organizer
      11th APCPST (Asia Pacific Conference on Plasma Science and Technology) and 25th SPSM (Symposium on Plasma Science for Materials),Abstracts of 11th APCPST & 25th SPSM, The 11th Committee on APCPST,The 153rd Committee on Plasma Materials Science, Japan Society for the Promotion of Science
    • Place of Presentation
      Kyoto University (Kyoto)
    • Year and Date
      20121000
  • [Presentation] Deposition and Electronic Characteristics of Antimony Doped Amorphous Carbon Films2011

    • Author(s)
      Hiroaki Okuyama, Naoto Ohtake
    • Organizer
      The 15th International Conference on Thin Films, The 15th International Conference on Thin Films, The Vacuum Society of Japan
    • Place of Presentation
      Kyoto Tersa (Kyoto)
    • Year and Date
      20111100
  • [Presentation] 金属含有アモルファスカーボン薄膜の合成と電気的特性評価2011

    • Author(s)
      奥山紘章,大竹尚登
    • Organizer
      第25回ダイヤモンドシンポジウム講演要旨集,ニューダイヤモンドフォーラム
    • Place of Presentation
      産業技術総合研究所(茨城)
    • Year and Date
      20110900
  • [Presentation] Sbドープアモルファス炭素膜の合成と電気的特性評価2011

    • Author(s)
      奥山紘章,大竹尚登
    • Organizer
      日本機械学会2011年度年次大会
    • Place of Presentation
      東京工業大学(東京)
    • Year and Date
      20110900
  • [Presentation] Sb含有アモルファス炭素膜の合成と電気的特性評価2011

    • Author(s)
      奥山紘章,齋藤啓,大竹尚登
    • Organizer
      第58回応用物理学関係連合講演会講演予稿集,応用物理学会
    • Place of Presentation
      神奈川工科大学(神奈川)不開催
    • Year and Date
      20110300
  • [Presentation] 金属ドープアモルファス炭素膜の合成と電気的特性評価2010

    • Author(s)
      奥山紘章,井関日出男,大竹尚登
    • Organizer
      第24回ダイヤモンドシンポジウム講演要旨集,ニューダイヤモンドフォーラム
    • Place of Presentation
      東京工業大学(東京)
    • Year and Date
      20101100

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Published: 2014-08-29  

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