2012 Fiscal Year Final Research Report
Purification of refractory metals used for the sputtering target
| Project/Area Number |
22360311
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| Research Category |
Grant-in-Aid for Scientific Research (B)
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| Allocation Type | Single-year Grants |
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| Section | 一般 |
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| Research Field |
Metal making engineering
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| Research Institution | Tohoku University |
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Principal Investigator |
MIMURA Kouji 東北大学, 多元物質科学研究所, 准教授 (00091752)
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| Co-Investigator(Kenkyū-buntansha) |
ISSHIKI Minoru 東北大学, 多元物質科学研究所, 教授 (20111247)
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| Project Period (FY) |
2010 – 2012
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| Keywords | 高純度金属 / 高純度精製 / 水素プラズマ溶解 / モリブデン / バナジウムジルコニウム / 減圧水素プラズマ |
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| Research Abstract |
Purification of refractory metals (Mo,V,Zr), required as the sputtering target for the advanced electronic devices, has been examined using the special melting methods such as hydrogen plasma arc melting (HPAM) and electron beam melting (EBM). Similar to EBM in high vacuum, HPAM under atmospheric pressure is confirmed to be useful for the remarkable reduction of volatile metallic impurities like Fe, Al, Cu and Cr from the melted metals. Also, HPAM is found to be a more practical purification method, due to very low vaporization loss of the melted metal during HPAM, different from EBM with high vaporization loss of the melted metal. Furthermore, it has been first verified in this work that HPAM under the low pressure is more efficient for the purification of refractory metals than HPAM under atmospheric pressure.
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