2012 Fiscal Year Final Research Report
Research on the high-power pulsed sputtering discharge and its application to ion sources for thin film fabrication.
| Project/Area Number |
22540501
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| Research Category |
Grant-in-Aid for Scientific Research (C)
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| Allocation Type | Single-year Grants |
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| Section | 一般 |
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| Research Field |
Plasma science
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| Research Institution | Ibaraki University |
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Principal Investigator |
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| Project Period (FY) |
2010 – 2012
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| Keywords | 放電 / 金属プラズマ源 |
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| Research Abstract |
In order to explore discharge properties of high-power pulsed magnetron sputtering (HPPMS)、 the voltage-current density characteristics and emission spectra were measured. It was found that HPPMS operated in the abnormal glow mode and the discharge area was extended over the whole radius of the cathode. The discharge voltage was found to rise while the primary electron confinement degraded by extention of the discharge area. Next、 we proposed an inhomogeneous Penning suputterinf device as a novel high-density metal ion source. It uses plasma drift as the mechanism of cross-field ion extraction.
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