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2012 Fiscal Year Final Research Report

Development of wide range-nanometer resolution-real time measurement system of charged up specimen irradiated by electron beam

Research Project

  • PDF
Project/Area Number 22560026
Research Category

Grant-in-Aid for Scientific Research (C)

Allocation TypeSingle-year Grants
Section一般
Research Field Thin film/Surface and interfacial physical properties
Research InstitutionOsaka Institute of Technology

Principal Investigator

KOTERA Masatoshi  大阪工業大学, 工学部, 教授 (40170279)

Project Period (FY) 2010 – 2012
Keywords電子顕微鏡 / 帯電電荷計測 / 静電気力顕微鏡法 / EBIC / フォギング電子
Research Abstract

Electrostatic force microscope system has been successfully completed to measure the potential distribution of a charged up insulator surface by electron beam irradiation. It is shown that the potential distribution built on a photo-mask, where an insulating film is on a conductive substrate, varies largely with the accelerating voltage and the current of the electron beam. On the other hand, we develop an electron trajectory simulation considering the behavior of electrons inside and outside of the specimen, and the result agrees well with the experimental result.

  • Research Products

    (28 results)

All 2013 2012 2011 2010 Other

All Journal Article (1 results) (of which Peer Reviewed: 1 results) Presentation (24 results) Remarks (3 results)

  • [Journal Article] Measurement of surface potential of insulating film on a conductive substrate in a scanning electron microscope specimen chamber2011

    • Author(s)
      Masatoshi Kotera, Akira Osada, Masaru Otani , Yasuhiro Ohara
    • Journal Title

      Journal of Vacuum Science and Technology

      Volume: B 29(6) Pages: 06F316-1-06F316-6

    • DOI

      DOI:10.1116/1.3662079

    • Peer Reviewed
  • [Presentation] 走査電子顕微鏡におけるフォギング電子電流の測定とシミュレーション(III)2013

    • Author(s)
      小原康寛,大谷優,長田明,小寺正敏
    • Organizer
      第60回応用物理学関係連合講演会
    • Place of Presentation
      神奈川工科大学
    • Year and Date
      2013-03-30
  • [Presentation] 走査電子顕微鏡内における電子ビーム照射による絶縁体薄膜表面電位分布の測定2013

    • Author(s)
      大谷優,長田明,小原康寛,熊谷健太朗,小寺正敏
    • Organizer
      第60回応用物理学関係連合講演会
    • Place of Presentation
      神奈川工科大学
    • Year and Date
      2013-03-30
  • [Presentation] 電子ビーム照射を受けた絶縁体薄膜の放電特性2013

    • Author(s)
      熊谷健太朗,大谷優,小原康寛,小寺正敏
    • Organizer
      第60回応用物理学関係連合講演会
    • Place of Presentation
      神奈川工科大学
    • Year and Date
      2013-03-30
  • [Presentation] 絶縁物試料の表面電位計測と理論解析2012

    • Author(s)
      小寺正敏
    • Organizer
      日本顕微鏡学会SEMの物理科学研究部会講演会
    • Place of Presentation
      常翔学園大阪センター
    • Year and Date
      2012-11-29
  • [Presentation] Electron Beam Current Dependence of Surface Potential Distribution at a Resist Film2012

    • Author(s)
      Akira Osada, Masaru Otani, KentaroKumagai and Masatoshi Kotera
    • Organizer
      2012 International Microprocesses andNanotechnology Conference
    • Place of Presentation
      神戸メリ ケンパークオリエンタルホテル
    • Year and Date
      2012-11-01
  • [Presentation] モンテカルロ法と帯電解析への応用2012

    • Author(s)
      小寺正敏
    • Organizer
      日本顕微鏡学会SEMの物理科学研究部会合宿討論会
    • Place of Presentation
      山梨山中湖ジュラク荘
    • Year and Date
      2012-10-13
  • [Presentation] 走査電子顕微鏡内フォギング電子が形成する絶縁体薄膜表面電位分布の測定22012

    • Author(s)
      大谷優,長田明,小原康寛,小寺正敏
    • Organizer
      第71回応用物理学会学術講演会
    • Place of Presentation
      愛媛大学
    • Year and Date
      2012-09-14
  • [Presentation] 走査電子顕微鏡におけるフォギング電子電流の測定とシミュレーション(II)2012

    • Author(s)
      小原康寛,大谷優,長田明,小寺正敏
    • Organizer
      第71回応用物理学会学術講演会
    • Place of Presentation
      愛媛大学
    • Year and Date
      2012-09-14
  • [Presentation] Measurement of fogging electron current in scanning electron microscope2012

    • Author(s)
      Yasuhiro Ohara, Akira Osada, MasaruOtani and Masatoshi Kotera
    • Organizer
      The 56th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication 2012,(EIPBN 2012)
    • Place of Presentation
      Hilton Waikoloa Village Resort in Waikoloa, Hawaii, USA
    • Year and Date
      2012-05-31
  • [Presentation] Measurement of Surface Potential Distribution at an Insulating Film Produced by Fogging Electrons in a Scanning Electron Microscope2012

    • Author(s)
      Masaru Otani, Akira Osada, YasuhiroOhara and Masatoshi Kotera
    • Organizer
      The 56th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication2012,(EIPBN 2012)
    • Place of Presentation
      Hilton WaikoloaVillage Resort in Waikoloa, Hawaii, USA
    • Year and Date
      2012-05-31
  • [Presentation] Charging process simulation of a resist film on Si substrate under electron beam irradiation2012

    • Author(s)
      Masatoshi Kotera, Akira Osada, MasaruOtani and Yasuhiro Ohara
    • Organizer
      The 56th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication2012,(EIPBN 2012)
    • Place of Presentation
      Hilton WaikoloaVillage Resort in Waikoloa, Hawaii, USA
    • Year and Date
      2012-05-30
  • [Presentation] 走査電子顕微鏡内フォギング電子が形成する絶縁体薄膜表面電位分布の測定2012

    • Author(s)
      大谷優,長田明,小原康寛,小寺正敏
    • Organizer
      第59回応用物理学関係連合講演会
    • Place of Presentation
      早稲田大学
    • Year and Date
      2012-03-16
  • [Presentation] 走査電子顕微鏡内の絶縁体薄膜表面電位分布のビーム電流依存性2012

    • Author(s)
      長田明,大谷優,小原康寛,小寺正敏
    • Organizer
      第59回応用物理学関係連合講演会
    • Place of Presentation
      早稲田大学
    • Year and Date
      2012-03-16
  • [Presentation] 走査電子顕微鏡におけるフォギング電子電流の測定とシミュレーション2012

    • Author(s)
      小原康寛,大谷優,長田明,小寺正敏
    • Organizer
      第59回応用物理学関係連合講演会
    • Place of Presentation
      早稲田大学
    • Year and Date
      2012-03-16
  • [Presentation] Measurement of surface potential distribution of resist irradiated by fogging electrons2011

    • Author(s)
      Akira Osada, Masaru Otani, YasuhiroOhara and Masatoshi Kotera
    • Organizer
      2011 International Microprocesses and Nanotechnology Conference
    • Place of Presentation
      京都全日空ホテル
    • Year and Date
      2011-10-26
  • [Presentation] Measurement of surface potential distribution of a resist film irradiated by electron beam2011

    • Author(s)
      Masatoshi Kotera, Akira Osada, MasaruOtani and Yasuhiro Ohara
    • Organizer
      37th International Conference on Micro & Nano Engineering (MNE 2011)
    • Place of Presentation
      The bcc Berliner Congress Center Berlin, Germany
    • Year and Date
      2011-09-20
  • [Presentation] Charging process simulation of a resist film on Si substrate by electron beam irradiation2011

    • Author(s)
      Akira Osada, Masatoshi Kotera, MasaruOtani and Yasuhiro Ohara
    • Organizer
      37th International Conference on Micro & Nano Engineering (MNE 2011)
    • Place of Presentation
      The bcc Berliner Congress Center Berlin, Germany
    • Year and Date
      2011-09-20
  • [Presentation] 走査電子顕微鏡内における絶縁体薄膜の表面電位分布測定2011

    • Author(s)
      長田明、小寺正敏
    • Organizer
      第72回応用物理学会学術講演会
    • Place of Presentation
      山形大学
    • Year and Date
      2011-08-30
  • [Presentation] 静電気力顕微鏡法による走査電子顕微鏡内の試料帯電の計測2011

    • Author(s)
      小寺正敏、長田明、大谷優、小原康寛
    • Organizer
      NGL2011
    • Place of Presentation
      東京工業大学
    • Year and Date
      2011-07-12
  • [Presentation] Measurement of Surface Potential of Insulating Film on Conductive Substrate in a Scanning Electron Microscope2011

    • Author(s)
      Masatoshi Kotera, Akira Osada, TakeshiKawamura and Kazuhito Arita
    • Organizer
      55th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (EIPBN 2011)
    • Place of Presentation
      JW Marriott Resort Las Vegas, USA
    • Year and Date
      2011-06-30
  • [Presentation] 走査電子顕微鏡内における絶縁体薄膜の表面電位分布測定2011

    • Author(s)
      長田明、小寺正敏
    • Organizer
      日本顕微鏡学会第67回学術講演会
    • Place of Presentation
      福岡国際会議場
    • Year and Date
      2011-05-16
  • [Presentation] Measurement of a surface potential of insulating materials in a scanning electron microscope2010

    • Author(s)
      Akira Osada, Masatoshi Kotera, Takeshi Kawamura and Kazuhito Arita
    • Organizer
      2010 International Microprocesses and Nanotechnology Conference
    • Place of Presentation
      リーガロイヤルホテル小倉
    • Year and Date
      2010-11-12
  • [Presentation] Surface potential measurement of insulating materials in a scanning electron microscope2010

    • Author(s)
      Masatoshi Kotera, Akira Osada, Takeshi Kawamura and Kazuhito Arita
    • Organizer
      36th International Conference on Micro & Nano Engineering (MNE 2010)
    • Place of Presentation
      Magazzini del Cotone Genoa, Italy
    • Year and Date
      2010-09-21
  • [Presentation] 電子ビーム照射に伴う絶縁体帯電現象解析のためのシミュレーション高速化2010

    • Author(s)
      小寺正敏、長田明
    • Organizer
      第71回応用物理学会学術講演会
    • Place of Presentation
      長崎大学
    • Year and Date
      2010-09-07
  • [Remarks] 学術雑誌発表論文

    • URL

      http://www.oit.ac.jp/elc/?kotera/paper/paper.html

  • [Remarks] 最近の国際会議発表

    • URL

      http://www.oit.ac.jp/elc/?kotera/paper/international.html

  • [Remarks] 最近の国内会議発表

    • URL

      http://www.oit.ac.jp/elc/?kotera/paper/domestic.html

URL: 

Published: 2014-08-29  

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