2012 Fiscal Year Final Research Report
Direct patterningof oxide films by coplanar type surface discharge
| Project/Area Number |
22560719
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| Research Category |
Grant-in-Aid for Scientific Research (C)
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| Allocation Type | Single-year Grants |
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| Section | 一般 |
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| Research Field |
Material processing/treatments
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| Research Institution | Shizuoka University |
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Principal Investigator |
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| Co-Investigator(Kenkyū-buntansha) |
MURAKAMI Kenji 静岡大学, 電子工学研究所, 准教授 (30182091)
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| Project Period (FY) |
2010 – 2012
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| Keywords | 沿面放電 / プラズマ / 薄膜 / 酸化亜鉛 |
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| Research Abstract |
Various techniques to prepare thin films have been reported during the decades. However, most of them basically require a high substrate temperature and/or a vacuum process. A novel thin film synthesis technique at low substrate temperature under ambient pressure should be developed. We focused on a coplanar surface discharge technique to meet the demand. Coplanar surface discharge is categorized to a dielectric barrier discharge in which high-energy plasma runs on the surface of an insulating substrate. In this study, we developed a coplanar surface discharge technique to prepare zinc oxide films.
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Research Products
(13 results)
