2012 Fiscal Year Final Research Report
Fabrication of oxide nanostructures using electron beaminduced deposition and their physical properties
| Project/Area Number |
22560727
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| Research Category |
Grant-in-Aid for Scientific Research (C)
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| Allocation Type | Single-year Grants |
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| Section | 一般 |
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| Research Field |
Material processing/treatments
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| Research Institution | Shibaura Institute of Technology (2011-2012)
Saitama Institute of Technology (2010) |
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Principal Investigator |
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| Co-Investigator(Renkei-kenkyūsha) |
MITSUISHI Kazutaka 物質材料研究機構, 量子ドットセンター, 主幹研究員 (40354328)
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| Project Period (FY) |
2010 – 2012
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| Keywords | ナノプロセス / ナノワイヤー / ナノセンサー |
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| Research Abstract |
Electron beam induced deposition (EBID) is one of the promising techniques to produce position-controlled nanometer-sized structures with high flexibility in their shape. In this process, an organometallic compound gas or vapor is decomposed by electron beam and the non-volatile part of the decomposed gas is deposited on substrates. In this research, oxide and gold nanostructures were fabricated using EBID and the photoconductive properties were studied on molybdenum oxide nanostructures.
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