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2012 Fiscal Year Final Research Report

Control of embedded Si nanocrystals in SiO2 by ion and laser beams

Research Project

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Project/Area Number 22604002
Research Category

Grant-in-Aid for Scientific Research (C)

Allocation TypeSingle-year Grants
Section一般
Research Field Quantum beam science
Research InstitutionAichi University of Education

Principal Investigator

IWAYAMA Tsutomu  愛知教育大学, 教育学部, 教授 (70223435)

Project Period (FY) 2010 – 2012
Keywordsイオン・レーザービーム / シリコンナノ結晶 / 光機能デバイス / 量子効果
Research Abstract

In this work, the potentialities of excimer UV-light irradiation and rapid thermal annealing to enhance the photoluminescence and to achieve low temperature formation of Si nanocrystals have been investigated. The implanted samples were subsequently irradiated with an excimer-UV lamp. After the process, the samples were rapidly thermal annealed before furnace annealing. We found that the luminescence intensity is strongly enhanced with excimer-UV irradiation and RTA.

  • Research Products

    (7 results)

All 2012 2011 2010

All Journal Article (4 results) (of which Peer Reviewed: 4 results) Presentation (3 results)

  • [Journal Article] Si nanocrystals formation in SiO2 by ion implantation : The effects of RTA and UV irradiation on photoluminescence.2012

    • Author(s)
      T.S.Iwayama
    • Journal Title

      Vacuum

      Volume: 86 Pages: 1634-1637

    • DOI

      10.1016/j.vacuum.2011.12.013

    • Peer Reviewed
  • [Journal Article] Excimer UV-light irradiation effects on the initial formation process of implanted luminescent Si nanocrystals.2010

    • Author(s)
      T.S.Iwayama, H.Watanabe, S.Fukaya,T.Hama and D.E.Hole
    • Journal Title

      Transa. Mater. Res. Soc. Jpn

      Volume: 35 Pages: 765-768

    • Peer Reviewed
  • [Journal Article] Influence of excimer UV irradiation on growth and optical properties of implanted Si nanocrystals.2010

    • Author(s)
      T.S.Iwayama, T.Hama and D.E.Hole
    • Journal Title

      IOP Conf. Ser.: Mater. Sci. Eng

      Volume: 15

    • DOI

      10.1088/1757-899X/15/1/012022

    • Peer Reviewed
  • [Journal Article] Influence of UV irradiation and RTA process on optical properties of Si implanted SiO2.2010

    • Author(s)
      T.S.Iwayama, T.Hama, D.E.Hole
    • Journal Title

      Nucl. Instrum. Methods B

      Volume: 268 Pages: 3203-3206

    • DOI

      10.1016/j.nimb.2010.05.089

    • Peer Reviewed
  • [Presentation] Optical properties of implanted Si nanocrystals: Effects of excimer-UV light irradiation and RTA on photoluminescence.2012

    • Author(s)
      T.S.Iwayama, T.Hama and D.E.Hole
    • Organizer
      International Conference on Nanoscience + Technology
    • Place of Presentation
      Paris, France
    • Year and Date
      20120723-27
  • [Presentation] Si nanocrystals formation in SiO2 by ion implantation : The effects of RTA and UV irradiation on photoluminescence.2011

    • Author(s)
      T.S.Iwayama
    • Organizer
      XX International Conference on Ion-Surface Interactions, August 25-29
    • Place of Presentation
      Zvenigorod, Russia (Invited)
    • Year and Date
      20110825-29
  • [Presentation] Influence of excimer UV irradiation on growth and optical properties of implanted Si nanocrystals.2010

    • Author(s)
      T.S.Iwayama, T.Hama and D.E.Hole
    • Organizer
      11th Europhysical Conference on Defects in Insulating Materials
    • Place of Presentation
      Pecs, Hungary
    • Year and Date
      20100712-16

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Published: 2014-08-29  

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