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2011 Fiscal Year Final Research Report

A study on of the high-aspect-ratio hole drilling process by the laser illumination

Research Project

  • PDF
Project/Area Number 22760094
Research Category

Grant-in-Aid for Young Scientists (B)

Allocation TypeSingle-year Grants
Research Field Production engineering/Processing studies
Research InstitutionChiba University

Principal Investigator

HIDAI Hirofumi  千葉大学, 大学院・工学研究科, 准教授 (60313334)

Project Period (FY) 2010 – 2011
Keywords特殊加工
Research Abstract

We have been reported that drilling a hole with the aspect ratio of >190 and the diameter of -8um in borosilicate glass was achieved by the fourth harmonics Nd : YVO4 laser illumination. In this project, I report the results of beam profile measurement in the hole to control the hole diameter and reveal the drilling process. Beam profiles that passed through holes were measured with a beam profiler and by knife edge scanning method. As a result, beam profile in the hole was constant regardless of the depth, and the intensity distribution was similar to a Gaussian distribution.
The laser plasma was observed with a high-speed camera. As a result, it is found that the generation duration of the laser plasma was 20ns. And, the laser plasma was restricted by the inside wall of the hole.

  • Research Products

    (4 results)

All 2012 2011 2010 Other

All Presentation (2 results) Remarks (1 results) Patent(Industrial Property Rights) (1 results)

  • [Presentation] レーザ光による高アスペクト比小径穴あけのメカニズムの解明2012

    • Author(s)
      藤井真人, 比田井洋史, 松坂壮太, 森田昇
    • Organizer
      2112年度精密工学会春期大会学術講演論文集
    • Year and Date
      20120000
  • [Presentation] 高アスペクト比穴加工時に発生するレーザプラズマの研究2011

    • Author(s)
      藤井真人, 比田井洋史, 松坂壮太, 森田昇
    • Organizer
      2111年度精密工学会秋期大会学術講演論文集
    • Year and Date
      20110000
  • [Remarks]

    • URL

      http://www.e1.eng.chiba-u.jp/~hidai/

  • [Patent(Industrial Property Rights)] スルーホール電極の形成方法2010

    • Inventor(s)
      中壽賀章, 江南俊夫, 比田井洋史, 伊東翔, 長澤正道, 立川茂
    • Industrial Property Rights Holder
      千葉大学
    • Industrial Property Number
      特許、特願2111-217333
    • Filing Date
      2010-09-28

URL: 

Published: 2013-07-31  

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