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2012 Fiscal Year Final Research Report

Development of Nano-scale structure design and process technology by advanced composite cluster beam

Research Project

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Project/Area Number 22760557
Research Category

Grant-in-Aid for Young Scientists (B)

Allocation TypeSingle-year Grants
Research Field Material processing/treatments
Research InstitutionKyoto University

Principal Investigator

SEKI Toshio  京都大学, 大学院・工学研究科, 講師 (00402975)

Project Period (FY) 2010 – 2012
Keywordsクラスター / 量子ビーム科学 / ナノプロセス
Research Abstract

Composite cluster beam generation apparatus was constructed and clusters composed with Ar gas and liquid materials, such as methanol, water or α-trichloroethane, were formed. When a Si target was irradiated with the CH3OH-Ar composite cluster ion beam, the intensity of secondary ions from the Si by composite cluster ion was 10 times higher than that by Ar cluster ion. This result shows that the CH3OH-Ar composite cluster ion beam is useful as probe beam of secondary ion mass spectroscopy.

  • Research Products

    (22 results)

All 2013 2012 2011 2010

All Journal Article (8 results) (of which Peer Reviewed: 8 results) Presentation (14 results)

  • [Journal Article] Development of gas cluster ion beam irradiation system with an orthogonal acceleration TOF instrument2013

    • Author(s)
      K.Ichiki, J. Tamura, T. Seki, T. Aoki and J. Matsuo
    • Journal Title

      Surface and Interface Analysis

      Volume: Vol.44,No.1 Pages: 522-524

    • DOI

      DOI:10.1002/sia.5092

    • Peer Reviewed
  • [Journal Article] Ion-induced damage evaluation with Ar cluster ion beams2013

    • Author(s)
      Y. Yamamoto, K.Ichiki, T. Seki, T. Aokiand J. Matsuo
    • Journal Title

      Surface and Interface Analysis

      Volume: Vol.44, No.1 Pages: 167-170

    • DOI

      DOI:10.1002/sia.5014

    • Peer Reviewed
  • [Journal Article] Molecular dynamics study of crater formation by core-shell structured cluster impact2012

    • Author(s)
      T. Aoki, T. Seki and J. Matsuo
    • Journal Title

      Nuclear Instruments and Methods in Physics Research B

      Volume: 282 Pages: 29-32

    • DOI

      DOI:10.1016/j.nimb.2011.08.061

    • Peer Reviewed
  • [Journal Article] Depth profiling analysis of damaged arginine films with Ar cluster ion beams2012

    • Author(s)
      J. Matsuo, K. Ichiki, Y. Yamamoto, T. Sekiand T. Aoki
    • Journal Title

      Surface and Interface Analysis

      Volume: Vol.44, No.6 Pages: 729-731

    • DOI

      DOI:10.1002/sia.4856

    • Peer Reviewed
  • [Journal Article] Etching of metallic materials with Cl2gas cluster ion beam2011

    • Author(s)
      T. Seki, T. Aoki and J. Matsuo
    • Journal Title

      Surface & Coatins Technology

      Volume: 206 Issues 5 Pages: 789-791

    • DOI

      DOI:10.1016/j.surfcoat.2011.04.054

    • Peer Reviewed
  • [Journal Article] Molecular dynamics simulations of large fluorine cluster impact on silicon with supersonic velocity2011

    • Author(s)
      T. Aoki, T. Seki and J. Matsuo
    • Journal Title

      Nuclear Instruments and Methods in Physics Research B

      Volume: 269 Pages: 1582-1585

    • DOI

      DOI:10.1016/j.nimb.2010.12.013

    • Peer Reviewed
  • [Journal Article] Surface morphology of PMMA surfaces bombarded with size-selected gas cluster ion beams2011

    • Author(s)
      K. Ichiki, S. Ninomiya, Y. Nakata, H. Yamada, T. Seki, T. Aoki and J. Matsuo
    • Journal Title

      Surface and Interface Analysis

      Volume: Vol.43, No.1-2 Pages: 120-122

    • DOI

      DOI:10.1002/sia.3444

    • Peer Reviewed
  • [Journal Article] High Speed Si Etching with ClF3 Cluster Injection2010

    • Author(s)
      T. Seki, Y. Yoshino, T. Senoo, K. Koike, S. Ninomiya, T. Aoki, and J.Matsuo
    • Journal Title

      AIP Conference Proceedings

      Volume: Vol. 1321 Pages: 317-320

    • DOI

      DOI:10.1063/1.3548393

    • Peer Reviewed
  • [Presentation] Si トレンチ構造への巨大フッ素クラスター衝突の MD シミュレーション2013

    • Author(s)
      青木学聡、瀬木利夫、松尾二郎
    • Organizer
      第60回応用物理学会学術講演会
    • Place of Presentation
      神奈川工科大学
    • Year and Date
      2013-03-29
  • [Presentation] ClF3 中性クラスタービームによる反応性エッチングの高速化2013

    • Author(s)
      瀬木利夫、吉野裕、妹尾武彦、小池国彦、青木学聡、松尾二郎
    • Organizer
      第60回応用物理学会学術講演会
    • Place of Presentation
      神奈川工科大学
    • Year and Date
      2013-03-29
  • [Presentation] ガスクラスターイオンビームによるDSPC の深さ方向 SIMS 分析2013

    • Author(s)
      中川駿一郎、瀬木利夫、青木学聡、松尾二郎
    • Organizer
      第60回応用物理学会学術講演会
    • Place of Presentation
      神奈川工科大学
    • Year and Date
      2013-03-28
  • [Presentation] High-speed Processing with ClF3 Cluster Injection2012

    • Author(s)
      T. Seki, Y. Yoshino, T. Senoo, K. Koike, T. Aoki, and J. Matsuo
    • Organizer
      IUMRS-International Conference on Electronic Materials (IUMRS-ICEM 2012)
    • Place of Presentation
      Yokohama, Japan
    • Year and Date
      20120923-28
  • [Presentation] 集束クラスターイオンビーム照射による直行加速飛行時間型 SIMS 分析2012

    • Author(s)
      中川駿一郎、瀬木利夫、青木学聡、松尾二郎
    • Organizer
      第73回応用物理学会学術講演会
    • Place of Presentation
      愛媛大学/松山大学
    • Year and Date
      2012-09-13
  • [Presentation] ClF3 クラスターイオンビームによる反応性エッチング2012

    • Author(s)
      瀬木利夫、吉野裕、妹尾武彦、小池国彦、青木学聡、松尾二郎
    • Organizer
      第73回応用物理学会学術講演会
    • Place of Presentation
      愛媛大学/松山大学
    • Year and Date
      2012-09-13
  • [Presentation] バブリング法によるメタノールクラスターイオンビーム生成2012

    • Author(s)
      瀬木利夫、青木学聡、松尾二郎
    • Organizer
      第59回応用物理学会
    • Place of Presentation
      早稲田大学
    • Year and Date
      2012-03-17
  • [Presentation] Cluster Beam Generation of Low Vapor Pressure Materials2011

    • Author(s)
      T. Seki, Y. Yoshino, T. Senoo, K. Koike, T. Aoki and J. Matsuo
    • Organizer
      21th MRS-J Symposium (International Session)
    • Place of Presentation
      Yokohama, Japan
    • Year and Date
      2011-12-20
  • [Presentation] The Effect of Size Variation in Sputtering with Size-Selected Cluster Ion Beams2011

    • Author(s)
      T. Seki, K. Ichiki, J. Tamura, T. Aoki and J. Matsuo
    • Organizer
      11th Workshop on Cluster Ion Beam Technology
    • Place of Presentation
      Tokyo, Japan
    • Year and Date
      2011-12-05
  • [Presentation] 高融点材料の混合クラスタービーム生成2011

    • Author(s)
      瀬木利夫、吉野裕、妹尾武彦、小池国彦、青木学聡、松尾二郎
    • Organizer
      第72回応用物理学会学術講演会
    • Place of Presentation
      山形大学
    • Year and Date
      2011-09-01
  • [Presentation] Si Processing with Energetic Neutral Cluster Beam2011

    • Author(s)
      T. Seki, Y. Yoshino, T. Senoo, K. Koike, T. Aoki and J. Matsuo
    • Organizer
      E-MRS 2011 Spring Meeting
    • Place of Presentation
      Nice, France
    • Year and Date
      2011-05-09
  • [Presentation] High-speed Si etching with ClF3 neutral cluster beam2010

    • Author(s)
      T. Seki, Y. Yoshino, T. Senoo, K. Koike, T. Aoki and J. Matsuo
    • Organizer
      20th MRS-J Symposium (International Session)
    • Place of Presentation
      Yokohama, Japan
    • Year and Date
      2010-12-22
  • [Presentation] 複合クラスター生成技術の開発2010

    • Author(s)
      瀬木利夫,青木学聡,松尾二郎
    • Organizer
      第71回応用物理学会学術講演会
    • Place of Presentation
      長崎大学
    • Year and Date
      2010-09-16
  • [Presentation] Etching Characteristics with Ar-Cl2 Gas Mixed Cluster Ion Beam2010

    • Author(s)
      T. Seki, T. Aoki and J. Matsuo
    • Organizer
      10th Workshop on Cluster Ion Beam Technology
    • Place of Presentation
      Kyoto, Japan
    • Year and Date
      2010-06-14

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Published: 2014-08-29  

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