Elucidation of Ionization Dynamics of Polymers for Nanofabrication by Using Quantum Beam

2011 Fiscal Year Final Research Report

• Project/Area Number: 22760669
• Research Category: Grant-in-Aid for Young Scientists (B)
• Allocation Type: Single-year Grants
• Research Field: Nuclear engineering
• Research Institution: Hokkaido University
• Principal Investigator: OKAMOTO Kazumasa 北海道大学, 大学院・工学研究院, 助教 (10437353)
• Project Period (FY): 2010 – 2011
• Keywords: 放射線 / X線 / 粒子線 / 半導体超微細化 / リソグラフィ / レジスト

Research Abstract

The microscopic charge dynamics in resist materials was studied by spectroscopy using quantum beam(extreme-ultraviolet free-electron laser(EUVFEL) and electron beam) as excitation source. It was suggested that the quantum efficiency of the acid yield in polymer films increases with decreasing the dose rate of the EUVFEL light. The charge dynamics in poly(styrene-acrylate) copolymers and poly(4-hydroxystyrene) was also studied by using pulse radiolysis.

Research Products

• [Journal Article] Dynamics of Radical Cation of Poly(4-hydroxystyrene)-Based Chemically Amplified Resists for Extreme-Ultraviolet and Electron Beam Lithographies (2011)
  • Author(s): Kazumasa Okamoto, Masafumi Tanaka, Takahiro Kozawa, Seiichi Tagawa
  • Journal Title: Jpn. J. Appl. Phys Volume: 50 Pages: 06GD03
  • DOI: DOI:10.1143/JJAP.49.106501
  • Peer Reviewed
• [Journal Article] Dynamics of radicalcation of poly(styrene acrylate)-based chemically amplified resist for extreme ultraviolet and electron beam lithography (2011)
  • Author(s): Yasuharu Tajima, Kazumasa Okamoto, Takahiro Kozawa, Seiichi Tagawa, Ryoko Fujiyoshi, and Takashi Sumiyoshi
  • Journal Title: Jpn. J. Appl. Phys Volume: 50 Pages: 06GD03
  • DOI: DOI:10.1143/JJAP.50.06GD03
  • Peer Reviewed
• [Journal Article] Fundamental study on reaction mechanisms in chemically amplified extreme-ultraviolet resists by using 61-nm free-electron laser (2011)
  • Author(s): Kazumasa Okamoto, Takahiro Kozawa, Takaki Hatsui, Yasuharu Tajima, Keita Oikawa, Mitsuru Nagasono, Takashi Kameshima, Tadashi Togashi, Kensuke Tono, Makina Yabashi, Hiroaki Kimura, Yasunori Senba, Haruhiko Ohashi, and Takashi Sumiyoshi
  • Journal Title: Proc. SPIE Volume: 7972 Pages: 797217
  • DOI: DOI:10.1117/12.879358
  • Peer Reviewed
• [Journal Article] Deprotonation mechanism of poly(styrene-acrylate)-based chemically amplified resist (2011)
  • Author(s): Yasuharu Tajima, Kazumasa Okamoto, Takahiro Kozawa, Seiichi Tagawa, Ryoko Fujiyoshi, and Takashi Sumiyoshi
  • Journal Title: Proc. SPIE Volume: 7972 Pages: 7972IN
  • DOI: DOI:10.1117/12.879362
  • Peer Reviewed
• [Presentation] レジスト高分子の放射線化学 (2012)
  • Author(s): 岡本一将、住吉孝
  • Organizer: 日本化学会第92春季年会
  • Place of Presentation: 慶応義塾大学
  • Year and Date: 2012-03-28
• [Presentation] Acid generation efficiency in resist films after exposure to the 61 nm free-electron laser light (2011)
  • Author(s): K. Oikawa, K. Okamoto, T. Kozawa, T. Hatsui, M. Nagasono, T. Kameshima, T. Togashi, K. Tono, M. Yabashi, H. Kimura, Y. Senba, H. Ohash, R. Fujiyoshi and T. Sumiyoshi
  • Organizer: MNC
  • Place of Presentation: ANA Hotel Kyoto, Kyoto, Japan
  • Year and Date: 2011-10-27
• [Presentation] 極端紫外自由電子レーザーによる極薄膜高分子内のスパー制御 (2011)
  • Author(s): 岡本一将、古澤孝弘、及川敬太、初井宇記、永園充、亀島敬、富樫格、登野健介、矢橋牧名、木村洋昭、仙波泰徳、大橋治彦、石川哲也、住吉孝
  • Organizer: 第54回放射線化学討論会
  • Place of Presentation: 大阪大学
  • Year and Date: 2011-09-30
• [Presentation] Fundamental study on reaction mechanisms in chemically amplified extreme-ultraviolet resists by using 61-nm free-electron laser, SPIE Advanced Lithography 2011 (2011)
  • Author(s): Kazumasa Okamoto, Takahiro Kozawa, Takaki Hatsui, Yasuharu Tajima, Keita Oikawa, Mitsuru Nagasono, Takashi Kameshima, Tadashi Togashi, Kensuke Tono, Makina Yabashi, Hiroaki Kimura, Yasunori Senba, Haruhiko Ohashi, and Takashi Sumiyoshi
  • Organizer: San Jose Convention Center and San Jose Marriott| San Jose
  • Place of Presentation: California, USA
  • Year and Date: 2011-03-02
• [Presentation] Dynamics of radical cation of poly(styrene-acrylate)-based chemically amplified resist for EUV and electron beam lithography (2010)
  • Author(s): Yasuharu Tajima, Kazumasa Okamoto, Takahiro Kozawa, Seiichi Tagawa, Ryoko Fujiyoshi, and Takashi Sumiyoshi
  • Organizer: MNC 2010, 23rd International Microprocesses and Nanotechnology Conference
  • Place of Presentation: Rihga Royal Hotel Kokura, Fukuoka, Japan
  • Year and Date: 2010-11-11
• [Presentation] 芳香族分子の電荷非局在性に関する研究 (2010)
  • Author(s): 岡本一将
  • Organizer: 第53回放射線化学討論会
  • Place of Presentation: 名古屋大学
  • Year and Date: 2010-09-22