2013 Fiscal Year Final Research Report
Damage-free etching of organic materials with mesoscopic cluster beams
| Project/Area Number |
23310080
|
|---|
| Research Category |
Grant-in-Aid for Scientific Research (B)
|
| Allocation Type | Single-year Grants |
|---|
| Section | 一般 |
|---|
| Research Field |
Nanomaterials/Nanobioscience
|
|---|
| Research Institution | University of Hyogo |
|---|
Principal Investigator |
TOYODA Noriaki 兵庫県立大学, 工学(系)研究科(研究院), 准教授 (00382276)
|
|---|
| Project Period (FY) |
2011-04-01 – 2014-03-31
|
| Keywords | クラスター / 有機材料 / ナノ加工 / ダメージフリー |
|---|
| Research Abstract |
Damage-free processing of organic materials with mesoscopic cluster ion beam was developed using pickup cell and by controlling charge state, cluster-size, and environment gas during irradiations. An in-situ XPS system connected to cluster ion beam system was used for damage evaluation of organic materials. It has been clarified that low-ionization voltage is required to suppress formation of multiply charged cluster ions. Besides, large cluster ions, and control of environment gas during irradiation is effective for low-damage processing of organic materials.
|
