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2013 Fiscal Year Final Research Report

Development of novel plasma-enhanced processes for low-temperature formation of high quality oxide semiconductor films

Research Project

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Project/Area Number 23360325
Research Category

Grant-in-Aid for Scientific Research (B)

Allocation TypeSingle-year Grants
Section一般
Research Field Material processing/treatments
Research InstitutionOsaka University

Principal Investigator

SETSUHARA Yuichi  大阪大学, 接合科学研究所, 教授 (80236108)

Co-Investigator(Renkei-kenkyūsha) TAKENAKA Kosuke  大阪大学, 接合科学研究所, 助教 (60432423)
Project Period (FY) 2011-04-01 – 2014-03-31
Keywordsプラズマ加工 / 低損傷プロセス / 反応性製膜 / 半導体薄膜 / 低温形成
Research Abstract

This research project has been carried out for development of novel plasma-enhanced processes to form high quality oxide semiconductor films at low substrate temperature using inductively coupled high-density low-damage plasma sources sustained with low-inductance antenna. The results of the present project have exhibited that good quality semiconductor films can be successfully formed at substrate temperatures as low as or lower than those acceptable for processing of a variety of polymers.

  • Research Products

    (13 results)

All 2014 2013 2012 2011

All Journal Article (1 results) (of which Peer Reviewed: 1 results) Presentation (12 results) (of which Invited: 5 results)

  • [Journal Article] Plasma-Enhanced Reactive Magnetron Sputtering Assisted with Inductively Coupled Plasma for Reactivity- Controlled Deposition of Microcrystalline Silicon Thin Films2013

    • Author(s)
      Kosuke Takenaka, Yuichi Setsuhara and Akinori Ebe
    • Journal Title

      Japanese Journal of Applied Physics

      Volume: 52 Pages: 11NB05

    • DOI

      10.7567/JJAP.52.11NB05

    • Peer Reviewed
  • [Presentation] RF plasma sources for PECVD and soft-material processes2014

    • Author(s)
      Yuichi Setsuhara, Soichiro Osaki, Kosuke Takenaka and Akinori Ebe
    • Organizer
      The International Symposium on Plasma-Nano Materials and Processes
    • Place of Presentation
      Seoul, Korea
    • Year and Date
      20140401-05
    • Invited
  • [Presentation] Properties of ICP-Enhanced Reactive Sputter Discharge for Formation of Advanced Semiconductor Films2014

    • Author(s)
      Yuichi Setsuhara, Kosuke Takenaka, Soichiro Osaki, Yutaro Suyama, Hirofumi Ohtani, Atsuki Kanai
    • Organizer
      6th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma 2014) / 7th International Conference on Plasma Nano Technology & Science(IC-PLANTS 2014)
    • Place of Presentation
      Nagoya, Japan
    • Year and Date
      20140302-06
  • [Presentation] Plasma-Enhanced Reactivity- Controlled Sputter Deposition Process for Low-Temperature Formation of Semiconductor Films2014

    • Author(s)
      Yuichi Setsuhara, Kosuke Takenaka, Hirofumi Ohtani, Atsuki Kanai, Soichiro Osaki
    • Organizer
      8th International Conference on Reactive Plasmas (ICRP- 8)/31st Symposium on Plasma Processing (SPP-31)
    • Place of Presentation
      Fukuoka, Japan
    • Year and Date
      20140204-07
  • [Presentation] Advanced reactive sputter deposition system enhanced with ICPs driven by new type of low- inductance antenna modules2013

    • Author(s)
      Yuichi Setsuhara, Soichiro Osaki, Kosuke Takenaka and Akinori Ebe
    • Organizer
      International Conference on Processing & Manufacturing of Advanced Materials (THERMEC'2013)
    • Place of Presentation
      Las Vegas, USA
    • Year and Date
      20131202-06
    • Invited
  • [Presentation] 高品質半導体薄膜作製のためのプラズマ支援反応性スパッタリングプロセスの高度制御2013

    • Author(s)
      節原 裕一, 竹中 弘祐, 大谷 浩史, 金井 厚毅, 大崎 創一郎, 江部 明憲
    • Organizer
      第74回応用物理学会学術講演会
    • Place of Presentation
      京都
    • Year and Date
      20130916-20
  • [Presentation] ICP-Enhanced Reactive Sputter Deposition Processes for Low-Temperature Formation of IGZO TFT2013

    • Author(s)
      Yuichi Setsuhara, Kosuke Takenaka, Akinori Ebe
    • Organizer
      35th International Symposium on Dry Process (DPS2013)
    • Place of Presentation
      Jeju, Korea
    • Year and Date
      20130829-30
  • [Presentation] ICP-Enhanced Reactivity-Controlled Sputter Deposition with New Type of Low-Inductance Antenna Modules for High-Rate and Large-Area Deposition of Functional Films2013

    • Author(s)
      Yuichi Setsuhara, Soichiro Osaki, Kosuke Takenaka, Akinori Ebe
    • Organizer
      The 9th Asian-European International Conference on Plasma Surface Engineering (AEPSE2013)
    • Place of Presentation
      Jeju, Korea
    • Year and Date
      20130825-30
  • [Presentation] Development of advanced ICP-enhanced reactive sputter deposition technologies for flexible devices2013

    • Author(s)
      Yuichi Setsuhara
    • Organizer
      The workshop of the Joint Institute for Plasma Nano Materials (IPNM)
    • Place of Presentation
      Nagoya, Japan
    • Year and Date
      2013-10-23
    • Invited
  • [Presentation] プラズマ支援反応性スパッタリング法による透明アモルファス酸化物半導体薄膜トランジスタ低温形成技術の開発2012

    • Author(s)
      節原 裕一, 趙 研, 大地 康史, 竹中弘祐, 江部 明憲
    • Organizer
      第59回応用物理学関係連合講演会
    • Place of Presentation
      東京
    • Year and Date
      20120315-18
  • [Presentation] Plasma- Enhanced Sputtering Assisted with ICP via New Type of Low-Inductance Antenna for Reactivity-Controlled and Low-Damage Formation of Semiconductor Films2012

    • Author(s)
      Yuichi Setsuhara, Yasufumi Ohchi, Ken Cho, Kosuke Takenaka, Akinori Ebe
    • Organizer
      13th International Conference on Plasma Surface Engineering
    • Place of Presentation
      Garmisch-Partenkirchen, Germany
    • Year and Date
      2012-09-13
  • [Presentation] Process Control Capabilities of ICP-Enhanced Sputter Discharge for Reactive Large-Area Deposition of Functional Films2012

    • Author(s)
      Yuichi Setsuhara, Kosuke Takenaka and Akinori Ebe
    • Organizer
      The 15th Korea-Japan Workshop for Advanced Plasma Process and Diagnostics
    • Place of Presentation
      Seoul, Korea
    • Year and Date
      2012-06-08
    • Invited
  • [Presentation] Plasma-Assisted Deposition of Functional Thin Films and Process Analyses for Development of Flexible Electronics2011

    • Author(s)
      Yuichi Setsuhara
    • Organizer
      International Union of Materials Research Society (IUMRS)- International Conference in Asia (ICA) 2011
    • Place of Presentation
      Taipei, Taiwan
    • Year and Date
      2011-09-20
    • Invited

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Published: 2015-06-25  

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