Measurements of Electron Conditions in High Pressure Plasmas for Materials Processing

2013 Fiscal Year Final Research Report

• Project/Area Number: 23540581
• Research Category: Grant-in-Aid for Scientific Research (C)
• Allocation Type: Multi-year Fund
• Section: 一般
• Research Field: Plasma science
• Research Institution: Chubu University
• Principal Investigator: NAKAMURA Keiji 中部大学, 工学部, 教授 (20227888)
• Co-Investigator(Renkei-kenkyūsha): SUGAI Hideo 中部大学, 工学部, 教授 (40005517)
• Project Period (FY): 2011 – 2013
• Keywords: 電子密度 / 電子状態 / モニタリング / プローブ

Research Abstract

In this study, employing microwave resonator probe available for electron density monitoring, we have investigated on application of the probe for atmospheric pressure plasma as well as extension of the probe function. In high-pressure plasma, resonance width of the observed probe spectra expands in proportional to electron density which suggests this method will be usable for electron density measurements. Accuracy of the measurement will be improved by considering resonance width observed without plasma. Further, we showed conditions for precise measurements in repetitive pulse discharge plasmas and possibility of simultaneous measurements of electron density and reactive species by installing optical fiber to the probe head on the basis of spectroscopic technique.

Research Products

• [Journal Article] Curling probe measurement of electron density in pulse-modulated plasma (2014)
  • Author(s): A. Pandey, W. Sakakibara and , H. Matsuoka, K. Nakamura and H. Sugai
  • Journal Title: Appl. Phys. Lett Volume: Vol. 104 Pages: 024111(1- 4)
  • Peer Reviewed
• [Journal Article] Opto-Curling Probe for Simultaneous Monitoring of Optical Emission and Electron Density in Reactive Plasmas (2013)
  • Author(s): A. Pandey, K. Nakamura and H. Sugai
  • Journal Title: Appl. Phys. Express Volume: Vol. 6 Pages: 056202-1
  • Peer Reviewed
• [Journal Article] Temperature dependence of coercivity behavior in Fe films on fractal rough ceramic surfaces (2013)
  • Author(s): M. Chen, Z. Jiao and , S. Yu, M. Yu, F. Bao and K. Nakamura
  • Journal Title: Jpn. J. Appl. Phys Volume: Vol. 52 Pages: 01AC13-1- 4
  • Peer Reviewed
• [Presentation] Simplified analysis and FDTD simulation of curling probe (2014)
  • Author(s): A. PANDEY, K. NAKAMURA and H. SUGAI
  • Organizer: 6th International Symposium on Advanced Plasma Science and its Application for Nitrides and Nanomaterials (ISPlasma2014) / 7th International Conference on Plasma-Nano Technology & Science (IC-PLANTS2014)
  • Place of Presentation: Meijo University, Japan
  • Year and Date: 2014-03-03
• [Presentation] Development of curling probe for monitoring of reactive plasmas (2014)
  • Author(s): K. Nakamura and H. Sugai
  • Organizer: 8th International Conference on Reactive Plasmas (ICRP2014) /31st Symposium on Plasma Processing(SPP-31)
  • Place of Presentation: Fukuoka Convention Center, Japan
  • Year and Date: 2014-02-07
  • Invited
• [Presentation] Curling probe analysis and simulation for collisional plasma (2014)
  • Author(s): A. Pandey, K. Nakamura and H. Sugai
  • Organizer: 8th International Conference on Reactive Plasmas (ICRP2014) /31st Symposium on Plasma Processing(SPP-31)
  • Place of Presentation: Fukuoka Convention Center, Japan
  • Year and Date: 2014-02-05
• [Presentation] Opto-curling Probe Method for Space-resolved Measurement of Electron and Radical Densities in Plasma (2013)
  • Author(s): A. Pandey, K. Nakamura and H. Sugai
  • Organizer: 35th Int. Symp. Dry Process (DPS2013)
  • Place of Presentation: Korea
  • Year and Date: 2013-08-30
• [Presentation] Opto-curling probe Monitoring of local density of electron and radicals (2013)
  • Author(s): A. Pandey, K. Kato. , S. Ikezawa, K. Nakamura and H. Sugai
  • Organizer: 21st International Symposium on Plasma Chemistry (ISPC2013)
  • Place of Presentation: Australia
  • Year and Date: 2013-08-06
• [Presentation] Monitoring of electron density and wall deposit by curling probe during plasma process (2012)
  • Author(s): A. Pandey, M. Imai, H. Kanematsu, S. Ikezawa, K. Nakamura and H. Sugai
  • Organizer: 34th Int. Symp. Dry Process (DPS2012)
  • Place of Presentation: Univ. Tokyo, Japan
  • Year and Date: 2012-11-16
• [Presentation] In-situ Photoluminescence Measurements of GaN Films Exposed to Inductively-Coupled Plasmas (2012)
  • Author(s): K. NAKAMURA, M. CHEN, Y. NAKANO and H. SUGAI
  • Organizer: 34th Int. Symp. Dry Process (DPS2012)
  • Place of Presentation: Univ. Tokyo, Japan
  • Year and Date: 2012-11-15
• [Presentation] In-situ Monitoring of Surface Modification of GaN Films Exposed to Inductively-Coupled Plasmas (2012)
  • Author(s): K. NAKAMURA, M. CHEN, Y. NAKANO and H. SUGAI
  • Organizer: 65th Annual Gaseous Electronics Conference (GEC)
  • Place of Presentation: U. S. A.
  • Year and Date: 2012-10-25
• [Presentation] Novel diagnostic tool, curling probe, for monitoring electron density during plasma processing (2012)
  • Author(s): A. PANDEY, Y. LIANG. , S. IKEZAWA, K. NAKAMURA and H. SUGAI
  • Organizer: 65th Annual Gaseous Electronics Conference (GEC)
  • Place of Presentation: U. S. A.
  • Year and Date: 2012-10-24
• [Presentation] Miniaturization of Plane-Type Microwave Resonator Probe with Multi-Resonant Frequencies (2012)
  • Author(s): K. Nakamura, H. Kumazaki and H. Sugai
  • Organizer: 5th International Conference on Plasma-Nano Technology & Science (IC-PLANTS2012)
  • Place of Presentation: Meitetsu Inuyama Hotel, Japan
  • Year and Date: 2012-03-09
• [Presentation] Miniaturization of plane-type microwave resonator probe (2012)
  • Author(s): E. Kumazaki, K. Nakamura and H. Sugai
  • Organizer: 4th International Symposium on Advanced Plasma Science and its Application for Nitrides and Nanomaterials (ISPlasma2012)
  • Place of Presentation: Chubu Univ. Japan
  • Year and Date: 2012-03-05