2013 Fiscal Year Final Research Report
Shape formation in silicon surface by transfer photo-etching using chemical reaction at fluorinating agent-silicon interface
| Project/Area Number |
23560123
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| Research Category |
Grant-in-Aid for Scientific Research (C)
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| Allocation Type | Multi-year Fund |
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| Section | 一般 |
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| Research Field |
Production engineering/Processing studies
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| Research Institution | Osaka University |
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Principal Investigator |
UCHIKOSHI Junichi 大阪大学, 工学(系)研究科(研究院), 招へい教員 (90273581)
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| Co-Investigator(Kenkyū-buntansha) |
MORITA Mizuho 大阪大学, 大学院工学研究科, 教授 (50157905)
KAWAI Kentaro 大阪大学, 大学院工学研究科, 助教 (90514464)
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| Project Period (FY) |
2011 – 2013
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| Keywords | フッ素化剤 / Ｎ－フルオロピリジニウム塩 / 光エッチング / 光転写 / シリコン / 3次元形状 / 半導体表面 / 形状創成 |
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| Research Abstract |
A new photo-etching method with N-fluoropyridinium salts is proposed in this study. Si is etched by applying N-fluoropyridinium salts to its surface and exposing the surface to light. Si is etched by the irradiation of light with an energy higher than the band gap of Si. The N-F bond in the salts is broken by receiving excited electrons and releases an active F species. The F species react with Si to produce SiF4. The SiF4 is released.
The etching rate increases with exposure time or light intensity or temperature. A ditch with different depths and a spherical surface and a flat surface are formed by exposing to light with different intensities at a time. It is expected to form arbitrary three-dimensional shape in a silicon surface by controlling light intensity distribution.
Absolute flatness of three silicon plane mirrors have been measured by a three-intersection method based on the three-flat method using a near-infrared interferometer.
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[Presentation] Optical property of random inverted-pyramid textures on Si surface by etching with Nfluoropyridinium salts2012
Author(s)
Masaki Otani, Junichi Uchikoshi, Kentaro Tsukamoto, Toshinori Hirano, Takabumi Nagai, Kenji Adachi, Kentaro Kawai, Kenta Arima, and Mizuho Morita
Organizer
PACIFIC RIM MEETING ON ELECTROCHEMICAL AND SOLID-STATE SCIENCE
Place of Presentation
Honolulu, Hawaii, U.S.A.
Year and Date
2012-10-10
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[Presentation] Cu assisted etching with N-fluoropyridinium salts2011
Author(s)
Kentaro Tsukamoto, Junichi Uchikoshi, Masaki Otani,Takabumi Nagai, Kenji Adachi, Kentaro Kawai, Kenta Arima, and Mizuho Morita
Organizer
Extended Abstracts of Fourth International Symposium on Atomically Controlled Fabrication Technology
Place of Presentation
Osaka, Japan
Year and Date
2011-10-10
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