2013 Fiscal Year Final Research Report
Study on nano machining technology using fullerenol molecules
| Project/Area Number |
23560129
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| Research Category |
Grant-in-Aid for Scientific Research (C)
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| Allocation Type | Multi-year Fund |
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| Section | 一般 |
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| Research Field |
Production engineering/Processing studies
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| Research Institution | Kyushu Institute of Technology |
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Principal Investigator |
SUZUKI Keisuke 九州工業大学, 大学院情報工学研究院, 准教授 (50585156)
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| Co-Investigator(Kenkyū-buntansha) |
KIMURA Keiichi 九州工業大学, 大学院情報工学研究院, 教授 (80380723)
KHAJORNRUNGRUNGANG Panart 九州工業大学, 先端金型センター, 助教 (60404092)
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| Project Period (FY) |
2011 – 2013
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| Keywords | 超精密加工 / 水酸化フラーレン / 混合微粒子 / サファイアCMP |
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| Research Abstract |
Novel functional fine particles are formed by mixing fullerenol solution and colloidal silica slurry for applying sapphire CMP. Material removal rate (MRR) of the sapphire CMP become higher than conventional colloidal silica slurry by using novel functional fine particles. In this cases, the MRR increases as the concentration of the C60(OH)n in the mixed slurry become higher. The variation of MRR against concentration of the C60(OH)n is effected by surface morphology of the sapphire substrate in this case.The fullerenol molecules such as C60(OH)n n=ca.10 are adsorbed on the colloidal silica particles for the fine particle by DLS and Raman results. From the peak shift of the DLS, we estimate that 2 layers of C60(OH)n molecules is coated around the colloidal silica particles. C60(OH)n molecules might be weakly bonded with the colloidal silica particle because the peak assigned as C60(OH)n molecules shift by the adsorption process on the Raman spectra.
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[Patent(Industrial Property Rights)] 研磨剤2011
Inventor(s)
鈴木恵友,木村景一,カチョーンルンルアンパナート,齊藤貴志,是澤 龍哉
Industrial Property Rights Holder
国立大学法人九州工業大学
Industrial Property Rights Type
公開特許公報(A)
Industrial Property Number
特許公開2012-248594
Filing Date
2011-05-26
Overseas
