• Search Research Projects
  • Search Researchers
  • How to Use
  1. Back to project page

2013 Fiscal Year Final Research Report

Preparation of uniform contact-interface applying nanocrystalline silicide with controlled crystalline grain size

Research Project

  • PDF
Project/Area Number 23560353
Research Category

Grant-in-Aid for Scientific Research (C)

Allocation TypeMulti-year Fund
Section一般
Research Field Electronic materials/Electric materials
Research InstitutionKitami Institute of Technology

Principal Investigator

NOYA Atsushi  北見工業大学, 工学部, 教授 (60133807)

Co-Investigator(Kenkyū-buntansha) TAKEYAMA Mayumi B  北見工業大学, 工学部, 准教授 (80236512)
Project Period (FY) 2011 – 2013
Keywords電気・電子材料 / シリサイド
Research Abstract

We have examined the formation of a uniform NiSi/Si contact-interface by reducing its crystalline grain size under the appropriate preparation conditions. It is revealed that the temperature during Ni sputter-deposition on the heated Si substrate and that during the following annealing process are important to reduce the crystalline grain size. Under a certain temperature, the growth of NiSi2, a high temperature phase, occurs at a lower temperature, resulting in the degradation of the uniform interface. It is speculated that the low temperature formation of NiSi2 is owing to the formation of an interdiffused Ni-Si layer with a concentration gradient of Ni, in which NiSi2 will nucleate from an alloy region in a Si-rich composition. We confirm the NiSi2 formation in the system of Ni on SiO2/Si, in which the Ni diffusion through a thin SiO2 layer reduces the diffusivity of Ni species, resulting in the formation of a Si-rich Ni-Si alloy from which NiSi2 will nucleate.

  • Research Products

    (5 results)

All 2014 2013 2012 2011

All Presentation (5 results)

  • [Presentation] Ni/Si系におけるNiSi2相の低温形成2014

    • Author(s)
      野矢, 武山
    • Organizer
      電気学会電子・情報・システム部門大会
    • Place of Presentation
      松江市(発表予定)
    • Year and Date
      20140900
  • [Presentation] 酸化層の介在したNi/Si系でのシリサイド反応2013

    • Author(s)
      野矢, 武山
    • Organizer
      電子情報通信学会総合大会
    • Place of Presentation
      新潟市(C-6-3)
    • Year and Date
      20130300
  • [Presentation] Ni/Si系におけるモノシリサイドとジシリサイドのマルチフェーズ形成2012

    • Author(s)
      野矢, 武山, 佐藤, 徳田
    • Organizer
      電子情報通信学会技術研究報告
    • Place of Presentation
      (vol.112,No.265,pp.49-53,CPM2012-102)
    • Year and Date
      20121000
  • [Presentation] Ni/Si固相反応におけるNiSi-NiSi2相の低温での共存形成2012

    • Author(s)
      野矢, 佐藤, 武山
    • Organizer
      2012年電子情報通信学会ソサイエティ大会
    • Place of Presentation
      富山市(C-6-1)
    • Year and Date
      20120900
  • [Presentation] NiSi相の形成とCuコンタクトへの適用2011

    • Author(s)
      武山, 佐藤, 野矢
    • Organizer
      電子情報通信学会技術研究報告
    • Place of Presentation
      (vol. 111, No.264, pp. 41-45, CPM2011−117)
    • Year and Date
      20111100

URL: 

Published: 2015-07-16  

Information User Guide FAQ News Terms of Use Attribution of KAKENHI

Powered by NII kakenhi