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2012 Fiscal Year Final Research Report

Development of novel function-controlled inorganic/organic layer-formationtechnology through integrated reaction studies on plasma interactions withnanolayers at surface and interface

Research Project

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Project/Area Number 23656465
Research Category

Grant-in-Aid for Challenging Exploratory Research

Allocation TypeMulti-year Fund
Research Field Material processing/treatments
Research InstitutionOsaka University

Principal Investigator

SETSUHARA Yuichi  大阪大学, 接合科学研究所, 教授 (80236108)

Co-Investigator(Renkei-kenkyūsha) TAKENAKA Kosuke  大阪大学, 接合科学研究所, 助教 (60432423)
Project Period (FY) 2011 – 2012
Keywordsプラズマ加工 / 無機/有機界面 / 無機/有機積層
Research Abstract

This research project has been carried out to seek for breakthroughs toovercome constraints involved in plasma processes for formation of functional inorganic layeron organic layer through integrated reaction studies on plasma interactions with nanolayers atsurface and interface. The results obtained from this project have indicated feasibility of lowdamage plasma process to reduce the damage-layer thickness as thin as a few nm especiallyvia controlling the energy of ion bombardment during the reactive plasma process.

  • Research Products

    (3 results)

All 2012 Other

All Journal Article (1 results) (of which Peer Reviewed: 1 results) Presentation (2 results)

  • [Journal Article] Plasma interaction with Zn nano layer on organicmaterials for analysis of early stage ofinorganic/organic hybrid multi-layer formation

    • Author(s)
      Ken Cho, Kosuke Takenaka, Yuichi Setsuhara
    • Journal Title

      Surface and Coatings Technology

    • DOI

      DOI:10.1016/j.surfcoat.2012.05.126

    • Peer Reviewed
  • [Presentation] Plasma-Enhanced ReactiveSputter Deposition with Low-Inductance Antennafor Low-Temperature Fabrication of FlexiblePhotovoltaic Devices2012

    • Author(s)
      Yuichi Setsuhara
    • Organizer
      The 6th InternationalConference on Technological Advances of ThinFilms & Surface Coatings
    • Place of Presentation
      Singapore
    • Year and Date
      20120714-17
  • [Presentation] Process Control Capabilitiesof ICP-Enhanced Sputter Discharge for ReactiveLarge-Area Deposition of Functional Films2012

    • Author(s)
      Yuichi Setsuhara
    • Organizer
      The15th Korea-Japan Workshop for AdvancedPlasma Process and Diagnostics
    • Place of Presentation
      Seoul, Korea
    • Year and Date
      20120607-08

URL: 

Published: 2014-09-25  

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