2013 Fiscal Year Final Research Report
Development of non-contact lithography toward 10 nm-node
Project/Area Number |
23686026
|
Research Category |
Grant-in-Aid for Young Scientists (A)
|
Allocation Type | Single-year Grants |
Research Field |
Production engineering/Processing studies
|
Research Institution | Hokkaido University |
Principal Investigator |
UENO Kosei 北海道大学, 電子科学研究所, 准教授 (00431346)
|
Project Period (FY) |
2011-04-01 – 2014-03-31
|
Keywords | 10 nm-node / ナノギャップ / ナノ・マイクロ加工 / プラズモニクス / 近接場リソグラフィー |
Research Abstract |
The nano-photolithography technology which carries out transcription exposure of the nanopattern with a nanometric accuracy on a positive photoresist surface was constructed using the feature with possible the metallic nanostructure which shows localized surface plasmon resonance making a nanometer-sized spatial region localize electromagnetic field. As the result, it succeeded in attaining principle verification of the non-contact nano-lithography technology of unexplored 10 nm-node.
|
Research Products
(65 results)
-
-
-
-
-
-
-
-
-
-
-
-
-
-
-
-
-
-
-
-
-
-
-
-
[Journal Article] Real-time imaging of acoustic rectification2011
Author(s)
S. Danworaphong, T. A. Kelf, O. Matsuda, M. Tomoda, Y. Tanaka, N. Nishiguchi, O. B. Wright, Y. Nishijima, K. Ueno, S. Juodkazis, H. Misawa
-
Journal Title
Appl. Phys. Lett
Volume: 99
Pages: 201910-1-3
Peer Reviewed
-
-
-
-
-
-
-
-
-
-
-
-
-
-
-
-
-
-
-
-
-
-
-
-
-
-
-
-
-
-
-
-
-
-
-
-
-
-
-
-
-
[Patent(Industrial Property Rights)] 金属構造体2012
Inventor(s)
上野 貢生, 三澤 弘明, 坪井 泰之, サウリウス ヨードカジス, ビガンタス ミ ゼイキス, 笹木 敬司
Industrial Property Rights Holder
ローム株式会社
Industrial Property Rights Type
特許
Industrial Property Number
特許5137344
Acquisition Date
2012-11-22
Overseas