2012 Fiscal Year Final Research Report
Novel etching process for graphene fabrication utilizing oxidation decomposition reaction
| Project/Area Number |
23710137
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| Research Category |
Grant-in-Aid for Young Scientists (B)
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| Allocation Type | Multi-year Fund |
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| Research Field |
Nanomaterials/Nanobioscience
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| Research Institution | National Institute for Materials Science |
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Principal Investigator |
ISHIDA Nobuyuki 独立行政法人物質・材料研究機構, ナノ材料科学環境拠点, NIMSポスドク研究員 (10451444)
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| Project Period (FY) |
2011 – 2012
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| Keywords | ナノ構造形成・制御 / グラフェン |
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| Research Abstract |
We show that graphene layers can be removed from graphite in a layer by layer manner using reactive oxygen species generated by plasma. However, Raman spectrum suggests that the surface of a fabricated graphene sheet by the etching is oxidized. Careful inspection of the oxidation decomposition process clarifies that oxidation occur only at the top most surface. These results indicate a possibility to establish a procedure that makes it possible to etch graphene layers from graphite with controlling the number of the layers. Our next step is to find a way to remove the top most oxidized graphene layer.
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