2012 Fiscal Year Final Research Report
Elucidation of effects of point defects on electrical properties of 4H-SiC and development of nrocesses for carrier lifetime control
Project/Area Number |
23760012
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Research Category |
Grant-in-Aid for Young Scientists (B)
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Allocation Type | Multi-year Fund |
Research Field |
Applied materials science/Crystal engineering
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Research Institution | Nagoya Institute of Technology |
Principal Investigator |
KATO Masashi 名古屋工業大学, 工学研究科, 准教授 (80362317)
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Project Period (FY) |
2011 – 2012
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Keywords | 半導体 / 結晶評価 / デバイス作製プロセス |
Research Abstract |
In this work, we introduced defects in 4H-SiC samples, and then observed deep levels and carrier lifetimes in the samples. The results show that deep levels were introduced in n-type samples by 2 MeV electron irradiation, and the deep levels would originate from carbon-antisite-vacancy related defects. Surface recombination does not significantly effect on the carrier lifetime. On the other hand, p-type samples irradiated with 160 keV electrons show deep levels from carbon-related complex defects and the deep levels possibly act as a recombination center.
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