2012 Fiscal Year Final Research Report
Fabrication of transparence micro-mold using thermal oxidation for nano-imprint
| Project/Area Number |
23760119
|
|---|
| Research Category |
Grant-in-Aid for Young Scientists (B)
|
| Allocation Type | Multi-year Fund |
|---|
| Research Field |
Production engineering/Processing studies
|
|---|
| Research Institution | Nagoya University (2012)
University of Hyogo (2011) |
|---|
Principal Investigator |
NODA Daiji 名古屋大学, 工学研究科, 招へい教員 (00378267)
|
|---|
| Project Period (FY) |
2011 – 2012
|
| Keywords | ナノインプリント / 透明金型 / 熱酸化 / 光インプリント / 超微細構造 / 高アスペクト比加工 / マイクロマシン / MEMS |
|---|
| Research Abstract |
Recently, X-ray phase imaging with X-ray gratings has been studied. I propose the new low cost fabrication process using Si mold using ICP-RIE and nano-imprint techniques. After thermal oxidation, Si micro-mold patterns were obtained until the bottom of high aspect ratio silicon dioxide microstructures. And, I tried the resin forming using fabricated Si mold. In these results, I obtained good grating patterns with submicron width. These demonstrations of thermal oxidation are promising method for high precision transparence imprint mold.
|
