2014 Fiscal Year Final Research Report
Study on the deposition of functionalized membrane with high-molecular-weight radicals and ions during hydroicarbon plasma
Project/Area Number |
24340144
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Research Category |
Grant-in-Aid for Scientific Research (B)
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Allocation Type | Partial Multi-year Fund |
Section | 一般 |
Research Field |
Plasma science
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Research Institution | Nagasaki University |
Principal Investigator |
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Co-Investigator(Renkei-kenkyūsha) |
MATSUDA Yoshinobu 長崎大学, 工学研究科, 准教授 (60199817)
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Project Period (FY) |
2012-04-01 – 2015-03-31
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Keywords | 炭化水素プラズマ / アモルファス炭素膜 / 高分子量のラジカル・イオン / 成膜 / 反応過程 / 赤外分光 / 付加反応 |
Outline of Final Research Achievements |
The amorphous carbon film deposition was investigated during plasma-enhanced chemical vapor deposition with a deuterated benzene as a source, by using in situ and real-time infrared absorption spectroscopy. A prominent peak attributed to the deuterated phenyl group was observed, indicating that the benzene ring structure is retained during the adsorption. The evolution of peaks observed during the plasma exposure suggested that the addition reaction occurs during the adsorption. The addition reaction occurs, even with applying negative bias to the substrate, while a lot of the benzene ring structures in the film were disrupted and the amount of alkane components increased, with the negative bias applied.
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Free Research Field |
プラズマ科学
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