Development of next-generation integrated circuits based on electronics and plasmonics

2014 Fiscal Year Final Research Report

• Project/Area Number: 24350104
• Research Category: Grant-in-Aid for Scientific Research (B)
• Allocation Type: Partial Multi-year Fund
• Section: 一般
• Research Field: Inorganic industrial materials
• Research Institution: Kyoto University
• Principal Investigator: FUJITA Koji 京都大学, 工学(系)研究科(研究院), 准教授 (50314240)
• Co-Investigator(Kenkyū-buntansha): MURAI Shunsuke 京都大学, 工学研究科, 助教 (20378805)
• Project Period (FY): 2012-04-01 – 2015-03-31
• Keywords: 表面プラズモン / 非貴金属材料

Outline of Final Research Achievements

In this research, we have fabricated high-quality, epitaxial thin films of TiN by using a pulsed-laser-deposition method to evaluate their plasmonic properties. The TiN epitaxial thin films, deposited on single crystalline magnesium oxide and sapphire substrates by a pulsed laser deposition, are metallic and show reasonably small optical loss in the visible and near infrared regions. By taking advantage of its compatibility with nanofabrication technique, we have also processed the thin films with nanoimprint lithography and reactive ion etching to make periodic arrays of TiN nanoparticles. The arrays support collective plasmonic modes, where the localized surface plasmons in nanoparticles are coupled through diffraction. The collective mode is associated with the intense field spatially extended in the plane of the array, so that it is advantageous for many optical applications including fluorescence enhancement, surface-enhanced Raman scattering, and solar cells.

Free Research Field

無機材料化学