Research on fabrication techniques of graphene nano structure construction on oxides substrate and observation them with atomic resolution

2014 Fiscal Year Final Research Report

• Project/Area Number: 24510164
• Research Category: Grant-in-Aid for Scientific Research (C)
• Allocation Type: Multi-year Fund
• Section: 一般
• Research Field: Nanomaterials/Nanobioscience
• Research Institution: National Institute of Information and Communications Technology
• Principal Investigator: TANAKA Shukichi 独立行政法人情報通信研究機構, 未来ICT研究所ナノICT研究室, 研究マネージャー (40284608)
• Co-Investigator(Kenkyū-buntansha): SUZUKI Hitoshi 国立大学法人広島大学, 先端物質科学研究科, 准教授 (60359099)
• Project Period (FY): 2012-04-01 – 2015-03-31
• Keywords: グラフェンナノ構造 / 原子間力顕微鏡 / CVD

Outline of Final Research Achievements

We have developed novel CVD process system, which enables us to produce graphene nano-structures on the specific part on the substrate, and investigated their physical properties by scanning probe microscopy without exposing them to atmospheric condition. At the very early stage of CVD process on Cu substrate, two kinds of nano-meter clusters, triangular type and hexagonal one, were found, and, by proceeding the growth, only hexagonal-type could be found, and that some of which formed nano-ribbon structures with their width of around 10nm under specific process condition. The LCPD (Local Contact Potential Difference) values of the surfaces were observed, and found that they gradually converge to the LCPD value of HOPG with increasing the number of sheet stacking.

Free Research Field

ナノ固体物性