Development of innovative high-efficiency, high-quality finishing method due to the electric field high speed CMP technology

2014 Fiscal Year Final Research Report

• Project/Area Number: 24560151
• Research Category: Grant-in-Aid for Scientific Research (C)
• Allocation Type: Multi-year Fund
• Section: 一般
• Research Field: Production engineering/Processing studies
• Research Institution: Akita Industrial Technology Center
• Principal Investigator: AKAGAMI Yoichi 秋田県産業技術センター, その他部局等, その他 (00373217)
• Co-Investigator(Kenkyū-buntansha): KUSUMI Takayuki 秋田県産業技術センター, 素形材プロセス開発部, 主任研究員 (40370233)
• Co-Investigator(Renkei-kenkyūsha): NAKMURA Ryuta 秋田県産業技術センター, 素形材プロセス開発部, 研究員 (00634213)
• Project Period (FY): 2012-04-01 – 2015-03-31
• Keywords: 研磨 / スラリー / サファイア

Outline of Final Research Achievements

In this study, we obtained new polishing technologies　for a high brittle material single crystal sapphire substrate used to LED. We provided high electric field under the polishing environment ,during high-speed rotation polishing platen,
we obtained the results to the excellent polishing quality and polishing rate that it is improved 31.7% using the sample of 6 inch size wafer for mass production, to be better than the conventional polishing method .

Free Research Field

工学