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2014 Fiscal Year Final Research Report

Study on surface barrier height in nitride-based semiconductors

Research Project

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Project/Area Number 24560399
Research Category

Grant-in-Aid for Scientific Research (C)

Allocation TypeMulti-year Fund
Section一般
Research Field Electron device/Electronic equipment
Research InstitutionUniversity of Fukui

Principal Investigator

TOKUDA Hirokuni  福井大学, 工学(系)研究科(研究院), 特命助教 (10625932)

Co-Investigator(Kenkyū-buntansha) KUZUHARA Masaaki  福井大学, 大学院工学研究科, 教授 (20377469)
Project Period (FY) 2012-04-01 – 2015-03-31
KeywordsAlGaN/GaN / heterostructure / barrier height / sheet electron density / mobility / Hall effect measurement
Outline of Final Research Achievements

We found that sheet electron density and electron mobility were increased in AlGaN/GaN heterostructures deposited with Ni/Al by annealing in vacuum. By optimizing the Ni/Al thickness, we achieved a room temperature mobility of 3050 cm2/Vs, which is the highest value ever reported for AlGaN/GaN heterostructures. To apply this technology for improving the device performance, we fabricated AlGaN/GaN HEMTs by placing vacuum annealed Ni/Al layers alongside the source electrode. The on-resistance between source and drain (Rds) was compared for with and without vacuum annealed Ni/Al layers. The results showed that Rds was reduced for the HEMTs with vacuum annealed Ni/Al layers, however, the amount of Rds reduction was much small than that was expected. Although the newly developed vacuum annealing technology can reduce the source resistance, the effect of the reduction is limited. There remains a challenge to study HEMTs’structure to which the vacuum annealing technology is applicable.

Free Research Field

半導体工学

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Published: 2016-06-03  

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