What should we do for fabrication of silicon nano structures using soft lithography techniques ?

2014 Fiscal Year Final Research Report

• Project/Area Number: 24560861
• Research Category: Grant-in-Aid for Scientific Research (C)
• Allocation Type: Multi-year Fund
• Section: 一般
• Research Field: Structural/Functional materials
• Research Institution: Toyo University
• Principal Investigator: HANAJIRI TATSURO 東洋大学, 理工学部, 教授 (30266994)
• Co-Investigator(Kenkyū-buntansha): MAEKAWA Toru 東洋大学, 理工学部, 教授 (40165634) ; NAKAJIMA Yoshikata 東洋大学, 学際・融合科学研究科, 准教授 (40408993) ; MIZUKI Toru 東洋大学, 学際・融合科学研究科, 准教授 (80408997) ; HIGASHI Toshiaki 東洋大学, バイオ・ナノエレクトロニクス研究センター, 研究助手 (90624742)
• Project Period (FY): 2012-04-01 – 2015-03-31
• Keywords: SPM / μ-TAS / SOQ / SOI / GO / rGO

Outline of Final Research Achievements

We established some techniques critical for design and fabrication bio-nano fusion systems by using soft lithography. We succeeded in developing a high-performance SPM for soft lithography. This SPM has atomic spatial resolution, and it has advantages for next-generation ultra fine patterning. We proposed that PDMS, grapheme and related materials should be helpful for ultra fine patterning of Si wires to develop novel devices for bio-nano fusion systems. We characterized fundamental properties of the advanced materials, and optimized their coating conditions for soft lithography. Finally, we proposed that SOI(Silicon On Insulator) wafers or SOQ (Silicon On Quartz) wafers should be favorable for platforms of bio-nano fusion systems, and we succeeded in analyzing the behaviors of electric fields in quarts layers of SOI wafers or SOQ wafers by formulating models using conformal transformation technique.

Free Research Field

ナノエレクトロニクス