2014 Fiscal Year Final Research Report
Nanocrystalline Silicon Films Prepared by Supersonic Free-Jet PVD
| Project/Area Number |
24560891
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| Research Category |
Grant-in-Aid for Scientific Research (C)
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| Allocation Type | Multi-year Fund |
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| Section | 一般 |
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| Research Field |
Material processing/treatments
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| Research Institution | Shibaura Institute of Technology |
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Principal Investigator |
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| Project Period (FY) |
2012-04-01 – 2015-03-31
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| Keywords | ナノ結晶材料 / ナノ粒子 / 超音速ガス流 / シリコン半導体 |
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| Outline of Final Research Achievements |
We have investigated nanocrystalline Si films on Oxygen-Free Copper substrate and glass substrate produced with Supersonic Free-Jet PVD (SFJ-PVD). The SFJ-PVD is a technique to deposit nanoparticles with supersonic gas flow and to form a thick coating film. Using SFJ-PVD technique, we obtain a uniform high-density Si coating films. Film crystallinity was analyzed with XRD and Raman spectroscopy. Si films have a poly-nanocrystalline structure with a grain size of 5 - 12nm. High crystallinity has been achieved without substrate heating and post annealing.
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| Free Research Field |
薄膜工学，材料加工処理
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