Development of LPCVD enables intermediate substances to flow into micropores of Y zeolite to deposit thin film for suppressing catalytic activity

2014 Fiscal Year Final Research Report

• Project/Area Number: 24560897
• Research Category: Grant-in-Aid for Scientific Research (C)
• Allocation Type: Multi-year Fund
• Section: 一般
• Research Field: Material processing/treatments
• Research Institution: Akita National College of Technology
• Principal Investigator: SATO Tsuneyuki 秋田工業高等専門学校, その他部局等, 教授 (80170760)
• Project Period (FY): 2012-04-01 – 2015-03-31
• Keywords: ゼオライト / ＣＶＤ / 長寿命化 / 細孔径制御

Outline of Final Research Achievements

In order to improve the life time of Y Zeolite catalyst we tried to develop a LPCVD enables intermediate substances to flow into micropores of Zeolite to deposit thin film for suppressing catalytic activity. we had started to assembled low pressure thermal CVD apparatus accompaning with continuous pressure reduction system since 2012. We also conducted fundamental experiments to measure the growth rate distribution of obtainined films depending various pressure(10 to 1700 Pa), various temperature(773K to 1173K), and various total flow rates(to max 100SCCM Nitrogen gas as carrie gas). In the above conditions, we were able to get one ideal film with smooth surface which were grown under 973K. We suppose a surface reaction rate is in a limiting step for growth. As future challenges we need to search a CVD mechanism occuring and an optimising the growth condition using the same apparatus.

Free Research Field

化学工学