Elucidation of local ionization in ultra-thin polymer films and its application

2014 Fiscal Year Final Research Report

• Project/Area Number: 24561037
• Research Category: Grant-in-Aid for Scientific Research (C)
• Allocation Type: Multi-year Fund
• Section: 一般
• Research Field: Nuclear engineering
• Research Institution: Hokkaido University
• Principal Investigator: OKAMOTO Kazumasa 北海道大学, 工学(系)研究科(研究院), 助教 (10437353)
• Project Period (FY): 2012-04-01 – 2015-03-31
• Keywords: レジスト / 放射線化学 / 極端紫外線（ＥＵＶ） / 自由電子レーザー / パルスラジオリシス / 電子線

Outline of Final Research Achievements

Dynamics of charges caused by the ionization in ultra-thin resist films and the following radiation chemistry have been investigated. Dependence of the acid yield in the resist on the local energy deposition was clarified by the irradiations of extreme-ultraviolet (EUV) free-electron laser and simulations. The reaction dynamics in the resist was also studied by using pulse radiolysis. Moreover, cause of decrease of the acid yield in fluorinated polymers with high EUV absorptivity was shown.

Free Research Field

放射線化学