Development of new hybrid orthodontic materials by Atomic Layer Deposition (ALD) method

2015 Fiscal Year Final Research Report

• Project/Area Number: 24593098
• Research Category: Grant-in-Aid for Scientific Research (C)
• Allocation Type: Multi-year Fund
• Section: 一般
• Research Field: Orthodontic/Pediatric dentistry
• Research Institution: Nagasaki University
• Principal Investigator: NAKAO Noriko 長崎大学, 病院(歯学系), 助教 (20333578)
• Co-Investigator(Kenkyū-buntansha): WATANABE Ikuya 長崎大学, 医歯薬学総合研究科(歯学系), 教授 (00274671)
• Co-Investigator(Renkei-kenkyūsha): TANAKA Motohiro 長崎大学, 工学系研究科(研究院), 客員研究員 (90420629)
• Project Period (FY): 2012-04-01 – 2016-03-31
• Keywords: 歯科矯正学

Outline of Final Research Achievements

Atomic Layer Deposition (ALD) is an advanced thin film coating method which is used to fabricate ultrathin. ALD process can be performed at relatively low temperatures. It is easy to receive the influence of the base material because it is a thin film though can do to various tones according to the film thickness. Ni and Ti ion release from nickel-titanium have decreased by Al2O3 ALD. Friction during orthodontic treatment is important for tooth movement. Aesthetical coating on nickel-titanium and stainless steel wires increase the frictional forces. However the frictional forces between the Al2O3 ALD wire and bracket may not affect the tooth movement during orthodontic treatment.

Free Research Field

歯科矯正学