2013 Fiscal Year Final Research Report
Magnet-free microwave sputter deposition with uniform target utilization
| Project/Area Number |
24654189
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| Research Category |
Grant-in-Aid for Challenging Exploratory Research
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| Allocation Type | Single-year Grants |
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| Research Field |
Plasma science
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| Research Institution | Nagoya University |
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Principal Investigator |
TOYODA Hirotaka 名古屋大学, 工学(系)研究科(研究院), 教授 (70207653)
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| Project Period (FY) |
2012-04-01 – 2014-03-31
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| Keywords | マイクロ波 / スパッタ / 表面波 / 均一プラズマ |
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| Research Abstract |
The purpose of this research is to obtain guideline for the development of two-dimensionally-uniform sputtering system using mirowave plasma production. Through this research, low pressure plasma production using microwave power is successfully realized. Furthermore, by applying RF power to the microwave plasma, uniform dielectric sputtering is realized with 10 cm square area. This is innovative result that cannot be realized by conventional sputtering system that utilize magnetic field. The result obtained by this project can be applied to various electronic device manufacturing.
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