2013 Fiscal Year Final Research Report
Formation of oxidation-resistant film on niobium based alloy using molten salt electrolysis
| Project/Area Number |
24656453
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| Research Category |
Grant-in-Aid for Challenging Exploratory Research
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| Allocation Type | Single-year Grants |
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| Research Field |
Metal making engineering
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| Research Institution | Tohoku University |
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Principal Investigator |
SATO Yuzuru 東北大学, 工学(系)研究科(研究院), 名誉教授 (80108464)
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| Project Period (FY) |
2012-04-01 – 2014-03-31
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| Keywords | 耐熱合金 / ニオブ基合金 / 珪化物 / 耐酸化性被膜 / 表面処理 / 溶融塩電解 / 電気化学 |
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| Research Abstract |
The purpose of this study is determining optimum electrolytic condition by investigating the electrochemical behavior of ions in molten salt in order to form an oxidation-resistant silicide film on Nb based alloy using molten salt electrolysis. As a result, it is found that thick film forms with lower current density (10 mA cm-2 is the best in this study) at higher temperature (1173 K is the best in this study). The concentration of solute (silicone source) does not show significant effect. NbSi2 film with a thickness of 55 to 70 micron was successfully obtained in a certain condition.
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