Production of thin film consisting of metal nano-helices and hierarchical elucidation of the novel mechanical properties

2014 Fiscal Year Final Research Report

• Project/Area Number: 24686018
• Research Category: Grant-in-Aid for Young Scientists (A)
• Allocation Type: Partial Multi-year Fund
• Research Field: Materials/Mechanics of materials
• Research Institution: Kyoto University
• Principal Investigator: TAKASHI Sumigawa 京都大学, 工学(系)研究科(研究院), 准教授 (80403989)
• Project Period (FY): 2012-04-01 – 2015-03-31
• Keywords: 斜め蒸着法 / 銅 / 低温制御動的斜め蒸着装置 / ナノらせん / 薄膜 / 変形 / 破壊 / 疲労

Outline of Final Research Achievements

In order to produce nano-helices from copper (Cu) by glancing angle deposition (GLAD), a vacuum evaporation system capable of both cooling a substrate and measuring its temperature was developed. Using this system, a thin film consisting of arrays of Cu nano-helices was successfully formed on silicon substrates by maintaining the substrate temperature at Ts/Tm < 0.22 (Ts: substrate temperature, Tm: melting temperature of target material). Additionally, the mechanical properties of nano-helices were examined. Although the nano-helix produced by GLAD possessed high yield stress, its elastic deformation property was governed only by the shape. The thin film consisting of Cu nano-helices exhibited large allowable fracture strain, and did not show fatigue fracture at N = 1×10＾6 cycles.

Free Research Field

微小材料強度学