Elucidation of mechanism of photo-crystal growth in chemical solution deposition method based on nano second temperature measurement under pulsed UV laser irradiation

2013 Fiscal Year Final Research Report

• Project/Area Number: 24760608
• Research Category: Grant-in-Aid for Young Scientists (B)
• Allocation Type: Multi-year Fund
• Research Field: Material processing/treatments
• Research Institution: National Institute of Advanced Industrial Science and Technology
• Principal Investigator: SHINODA Kentaro 独立行政法人産業技術総合研究所, 先進製造プロセス研究部門, 主任研究員 (10442732)
• Research Collaborator: TOMOHIKO Nakajima 独立行政法人産業技術総合研究所, 先進製造プロセス研究部門, 主任研究員 ; TSUCHIYA Tetsuo 独立行政法人産業技術総合研究所, 先進製造プロセス研究部門, グループ長 ; HATANO Mutsuko 東京工業大学, 大学院理工学研究科電子物 理工学専攻, 教授
• Project Period (FY): 2012-04-01 – 2014-03-31
• Keywords: 塗布光照射法 / ELAMOD / その場計測 / エキシマレーザー / 酸化物薄膜 / プロセスモニタリング / 透明導電膜 / ペロブスカイト酸化物

Research Abstract

In the excimer laser-assisted metal organic deposition (ELAMOD), a surface temperature rise at a few tens of nanoseconds upon the irradiation of pulsed UV laser is the key to the low temperature fabrication process of oxide thin films. In order to understand this photo-thermal process quantitatively, we have developed a novel system utilizing near-infrared sensors that can detect thermal emission signals from the irradiated surfaces. Utilization of plateau, which was observed in the emission signal history, enables the conversion of emission signal intensities into temperatures. This method enables us quantitative analysis of photo-thermal process of photo crystal growth in the ELAMOD process, and is also useful as a monitoring tool for excimer laser processing, which will expand the ability of ELAMOD process into flexible and printable electronics.

Research Products

• [Journal Article] Design of process diagnostics for excimer laser irradiation of oxide thin films (2014)
  • Author(s): K. Shinoda, T. Nakajima, M. Hatano, T. Tsuchiya
  • Journal Title: Japanese Journal of Applied Physics Volume: 53 Pages: 05FB08-1-6
  • DOI: 10.7567/JJAP.53.05FB08
  • Peer Reviewed
• [Journal Article] In situ monitoring of excimer laser annealing of tin-doped indium oxide films for the development of low-temperature fabrication process (2014)
  • Author(s): K. Shinoda , T. Nakajima, T. Tsuchiya
  • Journal Title: Applied Surface Science Volume: 292 Pages: 1052-1058
  • DOI: 10.1016/j.apsusc.2013.12.101
  • Peer Reviewed
• [Journal Article] 塗布光照射法による金属酸化物膜成長のその場計測 (2013)
  • Author(s): 篠田健太郎,中島智彦,土屋哲男
  • Journal Title: 日本電子材料技術協会会報 Volume: 44 Pages: 34-37
• [Journal Article] In situ measurement of crystallization of oxide thin films during irradiation of pulsed UV laser in chemical solution deposition process (2013)
  • Author(s): K. Shinoda, T. Nakajima, T. Tsuchiya
  • Journal Title: Applied Physics B Volume: 113 Pages: 479-484
  • DOI: 10.1007/s00340-013-5493-3
  • Peer Reviewed
• [Journal Article] Ultrafast temperature measurement at nanosecond timescale under irradiation of pulsed UV laser (2012)
  • Author(s): K. Shinoda, T. Nakajima, T. Tsuchiya
  • Journal Title: Proceedings of 5^<th> Tsukuba International Coating Symposium Pages: 57-58
• [Presentation] In situ temperature measurement of oxide thin films at a nanosecond time scale during pulsed UV laser irradiation (2014)
  • Author(s): K. Shinoda, T. Nakajima, T. Tsuchiya
  • Organizer: 第61回応用物理学会春季学術講演会
  • Place of Presentation: 相模原
  • Year and Date: 2014-03-17
• [Presentation] ナノ秒その場計測技術に基づくエキシマレーザープロセスの高度化 (2013)
  • Author(s): 篠田健太郎,中島智彦,土屋哲男
  • Organizer: 第33回エレクトロセラミックス研究討論会
  • Place of Presentation: つくば
  • Year and Date: 2013-10-29
• [Presentation] Design of process diagnostics for excimer laser irradiation of transparent conductive oxide thin films (2013)
  • Author(s): K. Shinoda, T. Nakajima, T. Tsuchiya
  • Organizer: JSAP-MRS Joint Symposia
  • Place of Presentation: Kyoto, Japan
  • Year and Date: 2013-09-17
• [Presentation] In situ monitoring of thermal radiation of tin-doped indium oxide thin films under excimer laser irradiation (2013)
  • Author(s): K. Shinoda, T. Nakajima, T. Tsuchiya
  • Organizer: 第60回応用物理学会春季学術講演会
  • Place of Presentation: 厚木
  • Year and Date: 2013-03-29
• [Presentation] Ultrafast temperature measurement at nanosecond timescale under irradiation of pulsed UV laser (2012)
  • Author(s): K. Shinoda, T. Nakajima, T. Tsuchiya
  • Organizer: 5^<th> Tsukuba International Coating Symposium
  • Place of Presentation: Tsukuba, Japan
  • Year and Date: 2012-11-29
• [Presentation] Thermal radiation measurement in ultrafast phenomena as a process monitoring tool (2012)
  • Author(s): K. Shinoda, T. Nakajima, T. Tsuchiya
  • Organizer: 5^<th> Asian Thermal Spray Conference
  • Place of Presentation: Tsukuba, Japan
  • Year and Date: 2012-11-26
• [Presentation] In situ monitoring of excimer laser annealing of tin-doped indium oxide films for the development of low-temperature fabrication process (2012)
  • Author(s): K. Shinoda, T. Nakajima, T. Tsuchiya
  • Organizer: The 2012 International Conference on Flexible and Printed Electronics (ICFPE2012)
  • Place of Presentation: Tokyo, Japan
  • Year and Date: 2012-09-07
• [Presentation] In situ measurement of crystallization of oxide thin films during irradiation of pulsed UV laser in chemical solution method (2012)
  • Author(s): K. Shinoda, T. Nakajima, T. Tsuchiya
  • Organizer: 8^<th> International Conference on Photo-Excited Processes and Applications
  • Place of Presentation: Rochester, NY, USA
  • Year and Date: 2012-08-13
• [Presentation] In situ measurement of fabrication of La-Ba-Mn-O films by ELAMOD process
  • Author(s): K. Shinoda, T. Nakajima, T. Tsuchiya
  • Place of Presentation: 松山
• [Remarks]
  • URL: https://staff.aist.go.jp/kentaro.shinoda/
• [Remarks] 受賞 篠田健太郎,中島智彦,土屋哲男,日本電子材料技術協会 第49回秋期講演大会優 秀賞, 2012/11/9