2015 Fiscal Year Final Research Report
Physical Design Technology Development for Advanced Lithography
| Project/Area Number |
25280013
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| Research Category |
Grant-in-Aid for Scientific Research (B)
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| Allocation Type | Partial Multi-year Fund |
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| Section | 一般 |
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| Research Field |
Computer system
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| Research Institution | Tokyo Institute of Technology |
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Principal Investigator |
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| Co-Investigator(Kenkyū-buntansha) |
KOHIRA YUKIHIDE 会津大学, コンピュータ理工学部, 上級准教授 (00549298)
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| Project Period (FY) |
2013-04-01 – 2016-03-31
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| Keywords | 計算機システム / 設計技術 / 設計工学 / 製造容易化 / リソグラフィ |
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| Outline of Final Research Achievements |
Advanced lithography such as double exposure techniques, self-aligned processes realizes a tiny circuit pattern on a wafer but requires various physical design technologies to realize high performance integrated circuits efficiently. In this research, various physical design technologies for advanced lithography such as pattern decomposition algorithm, shortest path algorithm with turn prohibition constraints, and intensity distribution estimation algorithm are developed.
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| Free Research Field |
設計自動化
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