Development of photoalignment techniques for microphase separated structure and their device applications

2015 Fiscal Year Final Research Report

• Project/Area Number: 25286025
• Research Category: Grant-in-Aid for Scientific Research (B)
• Allocation Type: Partial Multi-year Fund
• Section: 一般
• Research Field: Nanomaterials engineering
• Research Institution: Nagoya University
• Principal Investigator: Nagano Shusaku 名古屋大学, 工学(系)研究科(研究院), 准教授 (40362264)
• Project Period (FY): 2013-04-01 – 2016-03-31
• Keywords: 光配向 / 液晶性高分子 / ブロックコポリマー / ミクロ相分離構造 / 超分子液晶

Outline of Final Research Achievements

There has been an increase in research on applications of microphase separated (MPS) structure in block copolymer films to nanotemplate and nanopatterning materials. We have reported a photoalignment method for the MPS structure in liquid crystalline (LC) azobenzene block copolymer thin film with a polarized light irradiation. In this project, we have implemented the elucidation for the photoalignment mechanisms of the MPS structure in the LC block copolymer films and the application of the photoalignment method to molecular devices. We conducted 1) realtime observations for the molecular hierarchic structures in the photoalignment MPS system, 2) formation of a nano-relief surface via a supramolecular LC block copolymer films with detachable mesogens, 3) orientational control of MPS structure from a free surface with surface segregation. The proposals can be the breakthrough of the precise mechanism and new material strategies for the LC block copolymer photoalignment systems.

Free Research Field

光機能化学