Combining area-selective preparation of active surfaces with the inkjet technology to form functional nanostructures

2015 Fiscal Year Final Research Report

• Project/Area Number: 25288107
• Research Category: Grant-in-Aid for Scientific Research (B)
• Allocation Type: Partial Multi-year Fund
• Section: 一般
• Research Field: Inorganic industrial materials
• Research Institution: Kyoto University
• Principal Investigator: Hirao Kazuyuki 京都大学, 工学(系)研究科(研究院), 教授 (90127126)
• Co-Investigator(Kenkyū-buntansha): NISHI Masayuki 京都大学, 大学院工学(系)研究科(研究院), 講師 (50402962)
• Project Period (FY): 2013-04-01 – 2016-03-31
• Keywords: 金ナノ粒子 / 無電解 / シリコン / 集束イオンビーム

Outline of Final Research Achievements

Gold nanostructures have attracted increasing attention because of their size-dependent properties including Localized surface plasmon resonance. Localized surface plasmon resonance is, for example, important for surface enhanced Raman spectroscopy and sensors. Tailoring the size, the shape, and the integrated structure of gold nanostructures is necessary to utilize such properties efficiently. We demonstrated that gold nanostructures selectively grow on focused ion beam (FIB)-irradiated areas of a silicon substrate when the substrate is exposed to pure HAuCl4 solution. We revealed the mail mechanism of this new area-selective electroless deposition. We also combined the area-selective deposition with the inkjet technology to further control the growth of gold.

Free Research Field

無機構造化学