2015 Fiscal Year Final Research Report
Thin film growth and polarity control of hydrogenated amorphous carbon
| Project/Area Number |
25289083
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| Research Category |
Grant-in-Aid for Scientific Research (B)
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| Allocation Type | Partial Multi-year Fund |
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| Section | 一般 |
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| Research Field |
Electronic materials/Electric materials
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| Research Institution | University of Tsukuba |
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Principal Investigator |
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| Project Period (FY) |
2013-04-01 – 2016-03-31
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| Keywords | アモルファスカーボン / カーボン薄膜 / アモルファス / 反応性スパッタ成膜 / ドーピング / 極性制御 |
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| Outline of Final Research Achievements |
Film growth and control of carrier concentration of hydrogenated amorphous carbon (a-C:H) has been studied to develop a new semiconductor material characterized by abundance of its source material and no toxicity. The a-C:H was deposited by reactive plasma deposition method. The effect of F and Ca doping into a-C:H was examined referring to the results of Ag or Ca doping into fullerene, bathocuproine and so on where the electrical resistivity significantly changed by the doping. P and n type a-C:H were obtained by F and Ca doping, and the lowest resistivity obtained were 1x10E0Ωｃｍ with the carrier concentration of 1x10E19cm-3, and 1.0x10E-2Ωｃｍ with 1x10E20cm-3, respectively.
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| Free Research Field |
結晶工学
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